Asahi Glass Company, Limited

Kabushiki Kaisha Kobe Seiko Sho

Junichi Ebisawa

Eiichi Ando

Koichi Suzuki

Nobutaka Aomine

Susumu Suzuki

Kazuyoshi Noda

Daniel Decroupet

Satoshi Takeda

Akira Mitsui

Yasuo Hayashi

Kiyoshi Matsumoto

Kazuo Sato

Atsushi Hayashi

Takuji Oyama

Satoru Takaki

Katsuaki Aikawa

Masami Miyazaki

Toru Iseda

Masao Higeta

Ichiro Makino

Mikio Takehara

Akira Hirano

Toshihiro Kugimiya

Kazushi Hayashi

Yukio Yoshikawa

Noriyuki Yoshihara

Hirokazu Seki

Toshiyasu Kawaguchi

Koichi Osada

Takashi Kobori

Naoki Taneda

Hironori Ohta

Takashi Mukaiyama

Koushiro Kunii

Yoshikazu Yamada

Daikichi Arai

Katsuhiko Matsuzaki

An object of the present invention is to make it possible to uniformly supply of a gas onto a base material in a way simpler and lower in cost, and thus, to realize a high-quality surface treatment. For that purpose, in surface treatment of a base material () by supplying a surface-treating gas on the surface of the base material () while conveying it in a particular direction, the peripheral surface of a rotor having a cylindrical peripheral surface () is made to face, via a gap (), the surface of the base material () or an opposing member () formed at a position separated from the base material and the rotor is rotated around the axis in the direction almost perpendicular to the base material ()-conveying direction, as the means for supplying the surface-treating gas. By the rotation, the surface-treating gas is dragged in by the peripheral surface of the rotor (), guided into the gap (), and then, fed from the gap () onto the surface of the base material ().

Surface-treatment method and equipment

Glazing panel

A glazing panel carrying a solar control coating stack comprising in sequence at least: a glass substrate base antireflective layer comprising at least one layer comprising a nitride of aluminium an infra-red reflecting layer; and a top antireflective layer. The nitride of aluminium confers, inter alia, good thermal stability on the coating, particularly during heat treatment.

A method for forming an oxide film on a substrate by a sputtering process using a target comprising a metal as the main component, wherein sputtering is carried out in an atmosphere which contains a gas containing carbon atoms.

Oxide film, laminate and methods for their production

A glass laminate comprising a glass substrate, an oxide layer as a first layer formed on the glass substrate, and at least one multilayer (B) and at least one layer (C) which are laminated in this order or alternately on the first layer, wherein the first layer comprises a zinc oxide film (A) containing Al in a ratio of Al/(Al&plus;Zn) of from 15 to 50 at %, the layer (B) comprises Ag as the main component, the layer (C) is composed of at least one member selected from the group consisting of oxides, nitrides, carbides and double compounds thereof, and the total number of the first layer, the layer(s) (B) and the layer(s) (C) is 2n&plus;1 (wherein n is a positive integer).

Glass laminate, functional transparent article and method of its production

A transparent conductive film of a zinc oxide type containing gallium and silicon, which contains silicon in an amount of from 0.01 to 1.5 mol % in terms of SiO.sub.2.

Transparent conductive film and method for its production, and

A functional product having a transparent oxide layer and a silver layer alternately laminated on a transparent substrate in a total number of (2n+1) layers, where n.gtoreq.1, wherein an oxide film whose major component is an oxide containing tin and silicon, is formed on the outermost layer.

Functional product

Methods of producing a laminate

A functional product comprising at least one layer of a thin film having a function formed above a substrate; and at least one layer of an oxide film whose major component is an oxide containing tin and silicon, formed above the substrate.

The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.

Film comprising silicon dioxide as the main component and method for its

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Tokyo, Japan

Junichi Ebisawa