Samsung Electronics Co., Ltd.

K. C. Tech Co., Ltd.

Lg Display Co., Ltd.

Yonsei University

Te Connectivity Corporation

Tyco Electronics Amp Korea Co., Ltd.

Cg Bio Co., Ltd.

Institut Pasteur Korea

Qurient Co., Ltd.

Jung Yoon Kim

Kwang Hee Lee

Kwang Soo Park

Jin Heong Yim

Byoung Chul Choi

Hae Won Yang

Jae Jun Lee

Hyeon Jin Shin

Jong Kug Seon

Sang Kook Mah

Hyun Jun Jeong

Jun Ha Hwang

Soo Wan Choi

Nak Hyun Choi

Young Ho Kim

Jun Hyuk Seo

Sun Woo Park

Bruce Foster Bishop

Yi Yeol Lyu

Hyun Seung Ryu

Sung Jae Hwang

Jaeseung Kim

Sangchul Lee

Kiyean Nam

Sunhee Kang

SaeYeon Lee

Dongsik Park

Mooyoung Seo

Yeejin Jeon

Jang Kuk Kwon

Jeongjun Kim

Bo Hyeok Choi

Young-In Yang

Gahee Choi

Jiye Ahn

Seohyun Ahn

Hee Kwan Lee

Jung Won So

Doohyung Lee

Sung-Jun Han

Minjung Seo

Jeongjea Seo

Yunmi Lee

Min Hyeon Lee

Gi Joo Shin

Chan Un Jeon

June Gun Park

Ki Hwa Jung

Seong Pyo Lee

Jin Mo Yang

Jong Sang Son

Je Seong Ryu

The present invention relates to a polishing slurry composition. A polishing slurry composition according to an embodiment of the present disclosure comprises: a nonionic polymer having at least one amide bond; a selectivity control agent; and abrasive particles.

Polishing slurry composition

The present disclosure relates to a polishing slurry composition for an STI process and, more specifically, to a polishing slurry composition for an STI process, the polishing slurry composition comprising: a polishing solution including polishing particles; and an additive solution containing a polymer having an amide bond, and a polysilicon film polishing barrier inclusive of a monomer having three or more chains linked to one or more atoms.

Polishing slurry composition for sti process

The present invention relates to benzimidazole derivatives having the general formula I, wherein n is 0 or 1; Xand Xare independently, at each occurrence, CRor N; Y is C-Calkylene, wherein alkylene is optionally substituted with one to two C-Calkyl groups; Ris selected from the group consisting of hydrogen, halogen, C-Calkoxy, &#x2014;NH, &#x2014;NHR, &#x2014;NRRand &#x2014;NH&#x2014;(R)&#x2014;R, n being 0 or 1; Ris selected from the group consisting of hydrogen, halogen, C-Calkyl, &#x2014;NH, &#x2014;NHR, &#x2014;NRRand &#x2014;NH&#x2014;(R)&#x2014;R; Ris selected from the group consisting of hydrogen, hydroxyl, OR, &#x2014;NRR, C-Calkoxy, C-Calkyl, C-Ccycloalkyl, C-Chaloalkyl, &#x2014;C(O)NHR, aryl, heteroaryl and heterocyclyl, wherein each of said cycloalkyl, aryl, heteroaryl and heterocyclyl is optionally and independently substituted with one to four Rgroups; and Ris selected from the group consisting of &#x2014;NH, &#x2014;N(R)(V)R, &#x2014;NH(V)&#x2014;OR, &#x2014;NHC(O)R, and groups of formula 1a shown below, and their use in the treatment of diseases, in particular inflammatory diseases, cancer, stroke and/or Alzheimer's disease. 

2-amino-benzimidazole derivatives and their use as 5-lipoxygenase and/or prostaglandin E synthase inhibitors

An electronic device is disclosed. The electronic device may include a memory, and a processor electrically connected with the memory. The processor may be configured to install an application, allocate identification information, which is included in a preset range, to the installed application, store, at a first address of the memory, the identification information for indicating access privilege to a system resource, monitor the first address during running of a first process of the application, and terminate the first process, when the identification information stored at the first address is not included in the preset range. Moreover, various embodiment found through the disclosure are possible.

Electronic device detecting privilege escalation of process, and storage medium

The present invention relates to a polishing slurry composition for an STI process, the polishing slurry composition comprising: a polishing solution including polishing particles; and an additive solution containing a nitride film polishing barrier inclusive of a polymer having an amide bond.

Polishing slurry composition for STI process

A polishing slurry composition enabling implementation of multi-selectivity is provided. The polishing slurry composition includes: a polishing liquid including abrasive particles; and an additive liquid, in which the additive liquid includes a polymer having an amide bond, and a cationic polymer.

Polishing slurry composition enabling implementation of multi-selectivity

An electronic device is provided. The electronic device includes a memory configured to store an application and first unique information of the application, and at least one processor operatively connected with the memory. The at least one processor is configured to divide code of the application into a plurality of segments, select at least one segment among the plurality of segments, create second unique information in relation to the at least one segment, compare the first unique information and the second unique information, and determine whether the code of the application has been tampered with, based on a result of the comparison of the first unique information and the second unique information.

Method for detecting the tampering of application code and electronic device supporting the same

The present invention relates to a method for preparing a slurry composition and a slurry composition prepared thereby, and has advantages of reducing scratches and residual particles, which are considered to be one of the biggest factors contributing to the decline in yield due to macroparticles and aggregated particles, while maintaining a high polishing rate, in a semiconductor CMP process. Furthermore, the present invention can achieve excellent results in the application to various patterns required in the ultra-large scale integration semiconductor process, the wafer non-uniformity (WIWNU) exhibiting a polishing rate, polishing selectivity, and polishing uniformity, which meet the needs, and the micro-scratch minimization.

Method for preparing slurry composition and slurry composition prepared thereby

A method of manufacturing a 3D LDS liner includes providing an LDS sheet, forming 3D contoured liners in the LDS sheet, laser structuring circuit patterns on the 3D contoured liners to provide a laser structured circuit pattern, selectively plating the laser structured circuit patterns to form circuits on the 3D contoured liners, and removing the 3D contoured liners from the LDS sheet. A formed LDS liner includes a thin LDS film having a 3D contoured surface vacuum formed from an LDS sheet. The LDS film includes an inner surface and an outer surface. A laser structured circuit pattern is etched into the LDS film, and a conductive layer is selectively plated on the laser structured circuit pattern forming a circuit on the LDS film. The circuit may have a non-planar region.

3D formed LDS liner and method of manufacturing liner

The present invention relates to an anti-adhesion polymer composition capable of supporting growth factor, which effectively exhibits anti-adhesion function and, at the same time, has an excellent adhesive property so as to be able to easily and continuously adhere to a wound site, has antibacterial and hemostatic properties, and is composed of an injectable formulation suitable for use in minimally invasive surgery, laparoscopic surgery or the like. The anti-adhesion polymer composition capable of supporting growth factor comprises: 24-50 wt % of a polyethyleneglycol-polypropyleneglycol-polyethyleneglycol (PEG-PPG-PEG) block copolymer having a polyethyleneglycol (PEG) content of 65-85 wt % and a molecular weight of 6,000-20,000 Da; 0.03-5 wt % of gelatin; 0.03-5 wt % of chitosan; and distilled water.

Anti-adhesion polymer composition capable of supporting growth factor

A robotic gait training system includes a femoral support unit supporting a thigh of a patient, a hip joint support unit supporting buttocks of the patient, a lower leg support unit supporting a lower leg, an ankle support unit supporting an ankle, a support fixing toe tip positioned at an ankle height of the patient in use, a toe tip pad supporting and wrapping a forefoot of the patient, a tilt sensor, a first linear actuator operation unit rotating the femoral support unit based on the hip joint unit, a second linear actuator operation unit rotating the lower leg supporting unit based on the femoral support unit, a control unit generating a functional electric stimulation (FES) control signal, and an FES unit stimulating the plantarflexor or dorsiflexor of ankle joint based on the FES control signal received from the control unit.

Active robotic gait-training system and method

A roll stocker and a method for fabricating a liquid crystal display device using the same are disclosed. The roll stocker is constructed by multi-stage, of which roll keeping units of an upper stage can be moved left and right so that a rubbing roll at the lower stage can be easily taken out. Thus, space utilization can be enhanced and rolls can be stably kept. The roll stocker formed by two stages includes an upper stage installed at an upper side of a lower stage used as a support; a plurality of roll keeping units positioned at the upper and lower stages and keeping rubbing rolls; and a moving unit installed between the upper and lower stages and moving the roll keeping units of the upper stage.

Roll stocker and method for fabricating liquid crystal display device using the same

A multi-functional cyclic siloxane compound (A), a siloxane-based (co)polymer prepared from the compound (A), or compound (A) and at least one of a Si monomer having organic bridges (B), an acyclic alkoxy silane monomer (C), and a linear siloxane monomer (D); and a process for preparing a dielectric film using the polymer. The siloxane compound of the present invention is highly reactive, so the polymer prepared from the compound is excellent in mechanical properties, thermal stability and crack resistance, and has a low dielectric constant resulting from compatibility with conventional pore-generating materials. Furthermore, a low content of carbon and high content of SiOenhance its applicability to the process of producing a semiconductor, wherein it finds great use as a dielectric film.

Multi-functional cyclic siloxane compound and process for preparing dielectric film by using siloxane-based polymer prepared from the compound

A roll stocker includes a plurality of roll fixing units for fixing a plurality of rubbing rolls; shaft connection parts having a plurality of radially extended end portions connected with each roll fixing unit; and a rotational shaft for fixing the center of the shaft connection parts and rotating the shaft connection parts. A plurality of rubbing rolls can be rotated, and by keeping the plurality of rubbing rolls in storage in the closed roll stocker, contamination of a rubbing cloth due to external particles can be prevented, space utilization can be enhanced, and deviation of eccentricity of the rubbing rolls kept in storage can be prevented.

Multi-functional cyclic siloxane compound, a siloxane-based polymer prepared from the compound and a process for preparing a dielectric film by using the polymer

Growing community of inventors

Gyeonggi-do, South Korea

Jung Yoon Kim