Samsung Electronics Co., Ltd.

Jung-sung Hwang

Nam-hee You

Yo-Han Ahn

Soo-woong Lee

Yo-han Ahn

Hyung-seok Choi

Sung-hwan Choi

Tae-Jin Hwang

Sun-young Lee

Byung-Moo Lee

Hyun-Joon Kim

Dong-soo Lee

Sue-ryeon Kim

Kun-hyung Lee

Jae-Heung Choi

Seung-uhn Kim

Jae-Hyun Yang

Kwang-young Kim

Soon-young Lee

Dong-joo Lee

Jae-heung Choi

Yun-chul Oh

Young-jin Han

Gee-do Kim

Sang-Young Moon

Nam-Hee You

Seok-Ryeul Lee

Dong-Joo Lee

A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

Method of controlling pressure in a wafer transfer system

Wafer transfer system

An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.

Contamination control system and air-conditioning system of a substrate processing apparatus using the same

A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

Photolithography system and method of monitoring the same

An analysis system and method for a cleanroom environment is disclosed wherein on-line testing of water-soluble contaminants is performed by condensing water vapor from an air sample taken from the clean room. The condenser is connected to a analyzing unit that is used to measure and analyze the water-soluble contaminants in the condensed water received from the condensing unit.

Analysis system and method for water-soluble contaminants in a cleanroom environment

Methods of analyzing water-soluble contaminants comprise providing reference air streams having gaseous water present therein; condensing the reference air streams such that the gaseous water liquefies; pressurizing the liquefied water; and supplying the liquefied water to analyzers. Systems for analyzing water-soluble contaminants comprise air inlets that absorb reference air containing gaseous water therein; valves that control the flow of the reference air in fluid communication with the air inlets; condensers that condense the gaseous water in the reference air in fluid communication with the valves; pressurization pumps that pressurize the water condensed from the reference air in fluid communication with the condensers; and discharge pumps that discharge an excessive amount of water contained in the reference air.

Methods of analyzing water soluble contaminants generated during microelectronic device manufacturing processes

A monitoring device and a driving control system for a fan filter unit in a semiconductor clean room for monitoring the operating state of the fan filter unit. The monitoring device includes a switching section in each fan filter unit which alternately applies electrical power to one of a plurality of terminals. The switching section is responsive to a force from an air stream introduced therein via rotation of a fan in the fan filter unit. A display section in each fan filter unit is connected to the plurality of terminals which provide different signals, indicative of an on or off state of the fan, according to which of the plurality of terminals is electrically connected to the electrical power.

Driving control system and monitoring device for fan filter unit in

A fan drive checking system, for an air conditioning system in a clean room having a fan filter unit (FFU), includes a flow sensor for sensing air flow inside a housing of a FFU. The sensor provides a sensor signal indicative of normal and adverse flow conditions in the housing. A control portion in data communication with the sensor outputs a control signal responsive to the sensing signal. An alarm in data communication with the control portion provides a warning when the control signal indicates the adverse flow condition.

Drive checking system for fan filter units in clean room

Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26.degree. C. to about 40.degree. C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.

Aqueous compositions for making ultrapure water used in microelectronic

An air conditioning system for a semiconductor clean room includes a chemical filter between an air conditioner including a humidifier and a ULPA filter of the clean room, for ionizing chemical impurities using moisture supplied from the humidifier and then adsorbing the ionized chemical impurities by using the chemical filter. The chemical filter is installed downstream of the humidifier, which applies phosphoric acid for the prevention of scale-formation. This downstream location allows the chemical filter to prevent the phosphoric acid from being included in the fresh air as a new chemical impurity, which makes regulation of temperature and humidity of the air possible without having to use a special and expensive pure steam system.

Air conditioning system for semiconductor clean room including a

An apparatus for quantitatively depositing molecular impurities on a semiconductor wafer, includes a reaction chamber, a gas generator for generating a source gas serving as the molecular impurities, a humidifier for generating moisture vapour of a constant temperature, a mixer for mixing the source gas and the moisture vapour to generate a mixed gas, a gas injector for injecting the mixed gas into the reaction chamber, an exhausting part for initiating a vacuum condition in the reaction chamber before deposition of the molecular impurities and for exhausting a remaining gases after deposition of the molecular impurities, and a cleaning air supply portion for supplying a cleaning air into the reaction chamber before deposition of the molecular impurities. After fabricating a semiconductor device using the wafer processed as above, a defective source of mechanism of contamination can be traced by analysing the semiconductor device.

Apparatus and method for depositing molecular impurities on a

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Suwon-si, South Korea

Jung-sung Hwang