Semes Co., Ltd.

Korea Kumho Petrochemical Co., Ltd.

Jung-Keun Cho

Kyo-Woog Koo

Ho-Soo Hwang

Woo-Young Kim

Hyun-Jong Kim

Jeong-Yong Bae

Sung-Soo Kim

In-Ho Bang

Yong-Nam Choi

Chang-Ro Yoon

Joung-Hyeon Lim

Man-Seok Oh

In-Jun Kim

Jang-Seob Choi

In a method of manufacturing a carbon nanotube, a boat configured to receive substrates is positioned outside of a synthesis space where the carbon nanotube is synthesized. The substrates are loaded into the boat. The boat is then transferred to the synthesis space. A process for forming the carbon nanotube is performed on the substrates in the synthesis space to form the carbon nanotube. Thus, the carbon nanotube may be effectively manufactured.

Apparatus and system for manufacturing a carbon nanotube

A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes for wafers and having a plurality of process chamber stacked, and an interface part where a transfer bath is disposed to transfer wafers between the process chambers. When the wafers are transferred between the process chamber, the transfer bath is filled with deionized water (DI water) to prevent their exposure to the air. Wafers drawn out of the loading/unlading part are repositioned from a horizontal state to a vertical state and are transferred to a first process chamber being one of the process chambers to be subjected to a part of processes. After the wafers are transferred to a second process chamber being the other one of the process chambers to be subjected to the other processes, they are repositioned from a vertical state to a horizontal state. That is, the wafers are transferred along a loop shape to be processed.

Facility with multi-storied process chamber for cleaning substrates and method for cleaning substrates using the facility

Provided are an apparatus and method for synthesizing a conductive composite with enhanced electrical conductivity. The apparatus includes: an injection-molding machine which injection-molds pellets created by mixing carbon nanotubes (CNTs) with polymers; and an electric field generator which applies an electric field to the pellets that are melted while the melted pellets are injection-molded and thus rearranges the CNTs included in a composite into which the melted pellets are injection-molded.

Method for synthesizing conductive composite

The present invention provides an apparatus and method for cleaning substrates such as semiconductor wafers by sinking the substrates into cleaning fluids such as cleaning chemicals or rinsing liquids and then drying the substrates. The substrate clean and dry apparatus of present invention includes a process chamber comprising a cleaning chamber that carries the cleaning fluid and discharges at bottom the cleaning fluid; and a drying chamber above the cleaning chamber. The process chamber further includes a discharge device for evacuating the gas from the drying chamber, the gas supplied into the drying chamber. The discharge device is located between the cleaning chamber and the drying chamber, and evacuates the gas by force such that the gas is driven down vertically in the drying chamber. The substrate clean and dry apparatus of the present invention generates fairly vertical and uniform gas flows over the surfaces of substrates in the drying chamber, and also evacuates the gas rapidly from the drying chamber, thereby enhancing efficiency of the drying process.

Method and apparatus for cleaning and drying substrates

The present is directed to an apparatus for etching the top edge and bottom of a wafer. The apparatus includes a substrate support part for supporting a wafer and a movable protect part for preventing fluid for an etch from flowing into a non-etch portion of the wafer. The top edge and bottom of the wafer is etched by a wet etch, and a boundary of the non-etch portion and the edge of the wafer is etched by a dry etch.

Apparatus for treating substrate

Growing community of inventors

Seoul, South Korea

Jung-Keun Cho