Psk Inc.

Psk Holdings Inc.

Jung-Hyun Kang

Seung-Kook Yang

Je Hyeok Ryu

Jae Kyeong Yoo

Disclosed is a substrate processing apparatus that includes an interference member for minimizing a collision between a descending flow of gas supplied by a fan unit and a gas flow directed toward a transfer space from the inside of a container.

Substrate processing apparatus and method

Provided is a substrate treating apparatus, which includes a plasma generating part configured to generate plasma, a housing disposed under the plasma generating part, and having a space therein, a susceptor disposed within the housing and supporting a substrate, and a baffle including injection holes injecting the plasma supplied from the plasma generating part, to the substrate. The baffle includes a base in which the injection holes are formed, and a central portion of the base is thicker than an edge thereof.

Growing community of inventors

Gyeonggi-do, South Korea

Jung-Hyun Kang