Samsung Electronics Co., Ltd.

Jung-Hwan Park

Jongho Park

Joon-Sung Lim

Tae-Young Oh

Okcheon Hong

Kyung-Soo Ha

Keon-Soo Kim

Shinhwan Kang

Jong-Hyuk Kim

Hyong-Ryol Hwang

Donghwan Kim

Seong-Soon Cho

Young-Bae Yoon

Kwang-Shik Shin

Sanghun Chun

Seok-Jin Cho

Youngji Noh

Hyun-Chul Back

Hyung-Joon Chi

Disclosed are three-dimensional semiconductor memory devices, electronic systems including the same, and methods of fabricating the same. The three-dimensional semiconductor memory device includes a substrate including a cell array region and an extension region, a peripheral circuit structure including peripheral transistors on the substrate, a stack structure including interlayer dielectric layers and gate electrodes that are alternately stacked on the peripheral circuit structure, contacts that penetrate the stack structure on the extension region and are electrically connected with the peripheral transistors and include a protruding part contacting a sidewall of one of the gate electrodes and a vertical part penetrating the stack structure, and dielectric patterns between the vertical part and respective sidewalls of the gate electrodes. Top and bottom surfaces of each of the dielectric patterns are respectively in contact with adjacent ones of the interlayer dielectric layers.

Three-dimensional semiconductor memory devices, methods of fabricating the same, and electronic systems including the same

A memory device includes: a first memory bank and a second memory bank; a control logic configured to receive a command and control an internal operation of the memory device; and an error correction code (ECC) circuit configured to retain in a latch circuit first read data read from the first memory bank in response to a first masked write (MWR) command for the first memory bank based on a latch control signal from the control logic, generate a first parity from data in which the first read data retained in the latch circuit is merged with first write data corresponding to the first MWR command in response to a first write control signal received from the control logic, and control an ECC operation to retain in the latch circuit second read data read from the second memory bank based on the latch control signal.

Memory device having error correction function and operating method thereof

A semiconductor memory device includes a memory cell array and an address decoder. The memory cell array includes a plurality of memory blocks, each of the plurality of memory blocks includes a plurality of dynamic memory cells coupled to word-lines and bit-lines, each of the plurality of memory blocks are divided into a plurality of row blocks by row block identity bits of a row address, and each of the of row blocks includes a plurality of sub-array blocks arranged in a first direction. The address decoder changes a physical row address of a memory cell that stores or outputs data based on a column address received with a write command or a read command.

Semiconductor memory devices and methods of operating semiconductor memory devices

In a method of forming a pattern structure, a cut-off portion of the node-separated line of a semiconductor device is formed by a double patterning process by using a connection portion of the sacrificial mask pattern and the mask pattern to thereby improve alignment margin. The alignment margin between the mask pattern and the sacrificial mask pattern is increased to an amount of the length of the connection portion of the sacrificial mask pattern. The lines adjacent to the node-separated line include a protrusion portion protruding toward the cut-off portion of the separated line.

Method of forming a pattern structure for a semiconductor device

Semiconductor devices and a methods of fabricating the semiconductor devices are provided. The semiconductor devices may include a pattern on a substrate. The semiconductor devices may also include a capping dielectric layer on the pattern. The semiconductor devices may further include a first nitride layer on the capping dielectric layer. Moreover, the semiconductor devices may include a second nitride layer on the first nitride layer. A concentration of nitrogen in the first nitride layer may be greater than that in the second nitride layer.

Semiconductor devices and methods of fabricating the same

Semiconductor devices and a methods of fabricating the semiconductor devices are provided. The methods may include forming a pattern on a substrate, forming a capping dielectric layer on the pattern, and thermally processing the substrate. After thermally processing the substrate, the methods may further include forming a diffusion barrier layer by a nitride process that may include supplying nitrogen to the capping dielectric layer. The methods may also include forming an etching stop layer on the diffusion barrier layer, forming an inter-layer dielectric layer on the etching stop layer, and planarizing the inter-layer dielectric layer.

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Hwaseong-si, South Korea

Jung-Hwan Park