Sts Semiconductor & Telecommunications Co., Ltd.

Jung Hwan Chun

Gyu Han Kim

A semiconductor package and a method of manufacturing the same. The semiconductor package includes; a printed circuit board (PCB); a first semiconductor chip attached onto the PCB; an interposer that is attached onto the first semiconductor chip to cover a portion of the first semiconductor chip and comprises first connection pad units and second connection pad units that are electrically connected to each other, respectively, on an upper surface opposite to a surface of the interposer facing the first semiconductor chip; a second semiconductor chip attached onto the first semiconductor chip and the interposer as a flip chip type; a plurality of bonding wires that electrically connect the second connection pad units of the interposer to the PCB or the first semiconductor chip to the PCB; and a sealing member formed on the PCB to surround the first semiconductor chip, the second semiconductor chip, the interposer, and the bonding wires.

Semiconductor package comprising an interposer and method of manufacturing the same

A semiconductor package including a first package having a first semiconductor chip, a plurality of first inner leads electrically connected to the first semiconductor chip, and a plurality of first outer leads extending from the first inner leads and electrically connected to an external apparatus; and a second package having a second semiconductor chip and a plurality of second inner leads electrically connected to the second semiconductor chip, wherein an inactive surface of the first semiconductor chip and an inactive surface of the second semiconductor chip face each other, and the first inner leads contact the second inner leads to be electrically connected to each other.

Semiconductor package

A wafer-level package and a method of manufacturing the same. The wafer-level package includes a first semiconductor chip on an upper side of which an active surface facing downward is disposed, a redistribution formed on the active surface of the first semiconductor chip, a second semiconductor chip disposed on the redistribution using a flip-chip bonding (FCP) technique, a copper (Cu) post and a first solder ball sequentially disposed on the redistribution, a molding member formed on the active surface of the first semiconductor chip to expose a bottom surface of the first solder ball and an inactive surface of the second semiconductor chip, and a second solder ball disposed on the first solder ball and electrically connected to an external apparatus.

Wafer-level package and method of manufacturing the same

A method of manufacturing a high-capacity semiconductor package includes preparing a leadframe not comprising a chip mount area and comprising only a lead on a tape; attaching an interposer on a center area of the leadframe; stacking semiconductor chips stepwise on a first surface of the interposer; performing a first wire bonding process so as to connect the semiconductor chips, the lead, and the interposer; performing a first molding process so as to encapsulate a top surface of the leadframe, the semiconductor chips, and wires; detaching a tape from the leadframe and turning the leadframe on which the first molding process has been performed upside down; stacking semiconductor chips on a second surface of the interposer; performing a second wire bonding process so as to connect the semiconductor chips, the lead, and the interposer; and performing a second molding process so as to encapsulate a bottom surface of the leadframe, the semiconductor chips, and wires.

Method of manufacturing high-capacity semiconductor package

Provided is a method of dicing a wafer that is thin and includes a low-K material using plasma without causing chipping and cracking during sawing without using an etch mask and without performing a separate wafer coating process. The method includes recognizing scribe lines of a front side of the wafer by using an image recognizing unit to obtain recognition information, performing two etching processes, wherein at least one includes plasma etching, on a backside of the wafer by using the recognition information to separate the wafer into a plurality of semiconductor chips, and adhering the plurality of semiconductor chips to an extended tape or a die attach film.

Method of dicing wafer using plasma

Provided are a wafer through silicon via (TSV) forming method and equipment therefor. The wafer TSV forming method includes the operations of arranging a wafer having a front surface having a circuit area patterned thereon; recognizing locations of bond pads in the circuit area of the front surface of the wafer by using an image recognition camera, and converting the recognition of the locations into bond pad location information with respect to a back surface of the wafer; flipping the wafer; forming etching holes with middle depth in the back surface of the wafer by using a laser in a manner to match the locations of the bond pads by using the bond pad location information from the image recognition camera; and performing a plasma isotropic etching on the back surface having formed therein the etching holes with middle depth, thereby forming TSVs penetrating the bond pads.

Growing community of inventors

Chungcheongnam-do, South Korea

Jung Hwan Chun