Samsung Electronics Co., Ltd.

Lg Display Co., Ltd.

Electronics and Telecommunications Research Institute

Seoul National University

Sogang University Research Foundation

Jung-Hee Kim

Tae-Hyung Rhee

Kwan-Soo Han

Eun-Ji Kim

Gee-Sung Chae

Sang-Yeol Kim

Nam Ki

Gyu-Ho Lee

Woo-hyuk Jang

Woo-Hyuk Jang

Won-Bong Jang

Kyung-Hee You

Woo-Hyeuk Jang

Eun-Behm Kim

Yong-Woo Lee

Jae-cheol Lee

Dong-Hack Suh

Joon-Soo Kim

Kug-Jin Yun

Byong-gwon You

Sang-yun Yi

Hyun-Ki Kim

Jun-Young Jeong

Suk-Ju Kang

Young-Hak Lee

Jiwon Yang

Dae-sung Lee

Eunjeong Lucy Park

Sungzoon Cho

Heui-Sik Jeon

Woo-June Park

Hae-Sang Park

Gook-tae Son

Jooseoung Park

Disclosed herein are an apparatus for estimating a camera pose using multi-view images of a 2D array structure and a method using the same. The method performed by the apparatus includes acquiring multi-view images from a 2D array camera system, forming a 2D image link structure corresponding to the multi-view images in consideration of the geometric structure of the camera system, estimating an initial camera pose based on an adjacent image extracted from the 2D image link structure and a pair of corresponding feature points, and estimating a final camera pose by reconstructing a 3D structure based on the initial camera pose and performing correction so as to minimize a reprojection error of the reconstructed 3D structure.

Apparatus for estimating camera pose using multi- view image of 2D array structure and method using same

An apparatus and method of segmenting sensor data are provided. The apparatus includes a sensor, a first segmentation unit, a continuity evaluation unit, a second segmentation unit, and a segmentation determination unit. The sensor collects sensor data for a process of the semiconductor manufacturing facility. The first segmentation unit extracts a variation point of the sensor data to perform an abnormal difference (AD) segmentation on the sensor data based on the at least one variation point. The continuity evaluation unit evaluates a continuity ratio of the sensor data. The second segmentation unit performs a free-knot spline (FS) segmentation on the sensor data when the continuity ratio exceeds a reference ratio. The segmentation determination unit compares the AD segmentation result with the FS segmentation result and to select one of the results on the comparison result.

Apparatus and method of segmenting sensor data output from a semiconductor manufacturing facility

A display device includes a display panel having a display area and a bezel area formed around edges of the display area; a backlight unit disposed on a rear side of the display panel to provide light to the display panel; a supporting member to support the display panel and the backlight unit; and a top case having at least one joint and incorporated with a surface of the supporting member, wherein the top case has a main frame combined with the supporting member, and a sub frame having a design of at least one color and disposed on the bezel area.

Display device

A display device includes a display panel having a display area and a bezel area formed around edges of the display area; a backlight unit disposed on a rear side of the display panel to provide light to the display panel; a supporting member to support the display panel and the backlight unit; and a top case having at least one joint and incorporated with a surface of the supporting member, wherein the top case has a main frame combined with the supporting member and a sub frame disposed on the bezel area and combined with the main frame.

A method of calculating a probability of failures caused only by defects, a method of calculating a defect limited yield using the classification of pattern parameters extracted only from the defects, and a system for calculating the probability of failure and the defect limited yield are provided. In one exemplary embodiment for calculating a probability of failures caused only by defects, defects are detected in inspected blocks that have defects and in blocks located around the inspected blocks to measure the number of inspected blocks that have failures caused by reasons other than the defects in the blocks located around the inspected blocks having defects (n), the number of inspected blocks having no failures in the blocks located around the inspected blocks having the defects (n), the number of inspected blocks having failures caused by defects in the inspected blocks having defects (n), and the number of inspected blocks having no failures in the inspected blocks having defects (n). The data (n) through (n) is then substituted in the following formula:whereand

Method of measuring the probability of failure caused only by defects, method of measuring defect limited yield, and system using the same

The present invention provides an optical polyimide precursor for use in making a polyimide. The precursor is defined by the following formula:wherein X is Cl, Br, oxo-halide, or fully halogenated alkyl, and A is a divalent aromatic or halogenated aromatic moiety. The present invention provides a method of preparing a diamine compound for use as an optical polyimide precursor. The method includes the steps of dissolving 2-chloro-5-nitrobenzotrifluoride and a diol in N,N-dimethylacetamide to form a solution, adding potassium carbonate, tert-butylammonium chloride and copper powder to said solution and heating the resulting mixture, removing the copper, precipitating and recrystallizing a dinitro-compound resulting from heating the mixture, and dissolving the dinitro-compound and reducing the dinitro-compound to yield a diamine compound.

Optical polyimide precursor, optical polyimide compound and fabricating method thereof

Optical waveguide

A thermo-optic switch using a small drive power while exhibiting a reduction in the coupling loss caused by the coupling to optical fibers and a switch speed of several hundred microseconds or less. A method for manufacturing the thermo-optic switch and a method for changing an optical line switching using the thermo-optic switch are also disclosed. The thermo-optic switch includes a substrate having etched portions at regions respectively corresponding to input and output terminals of the thermo-optic switch, a lower clad layer formed over the substrate, the lower clad layer having an input taper formed at the region corresponding to the input terminal and adapted to convert a circular mode, input from an optical fiber connected to the input terminal, into an oval mode having a rib shape, and an output taper formed at the region corresponding to the output terminal and adapted to convert the oval mode into a circular mode allowed to be input to an optical fiber connected to the output terminal, a core layer formed over the lower clad layer and provided with branched waveguides having a rib structure, the branched waveguides selectively receiving the oval mode from the input taper and outputting the received oval mode to the output taper, an upper clad layer formed over the core layer, and switching electrodes formed on the upper clad layer and selectively activated to apply heat to an associated one of the branched waveguides in such a fashion that an effective refractive index difference occurs between the branched waveguides, thereby causing the branched waveguides to selectively receive the oval mode from the input taper.

Method for manufacturing the thermo-optic switch, and method for changing optical line using the thermo-optic switch

The present invention discloses a polymer optical waveguide and a method of fabricating the same. The polymer optical waveguide comprises a core formed of polymer containing fluoride (F) of a 12-37 wt % on the basis of total weight of the polymer, and having repeating units with at least two &mdash;C(&boxH;O)&mdash;N&mdash;C(&boxH;O) functional groups or at least four &mdash;N&mdash;C(&boxH;O)&mdash; functional groups; and a cladding in contact with the core and formed of polymer having a refractive index lower than the polymer for forming the core. If a core layer is etched according to the ICP etching method, the etch rate becomes at least three times faster than that of the conventional RIE etching method. Also, etching characteristics including uniformity of an etched plane and vertical profile are improved, thereby reducing damage to an optical waveguide. Thus, the light scattering loss of the optical waveguide can be minimized. Also, the method for fabricating of a polymer optical waveguide according to the present invention is useful for mass production of polymer optical waveguides.

Polymer optical waveguide and method for fabricating the same

A method of fabricating a planar optical waveguide in one chamber, comprising the steps of depositing a cladding layer and a core layer on a substrate, depositing an etch mask layer on the core layer, and forming a photoresist pattern on the etch mask layer. An etch mask pattern is formed by etching the etch mask layer according to the photoresist pattern using a first gas which reacts with the material of the etch mask layer, and removing the first gas. An optical waveguide is formed by etching the core layer according to the etch mask pattern using a second gas which reacts with the material of the core layer in the same chamber as the chamber where the above steps were performed, and removing the photoresist pattern and the second gas. The etch mask pattern is removed using the first gas which reacts with the material of the etch mask pattern in the same chamber as the chamber where the above steps were performed, and removing the first gas, and depositing an upper cladding layer formed of the same material as the core layer on the resultant structure of the above step. Accordingly, processes for fabricating an optical waveguide can be continuously performed in one chamber, thus simplifying and automating the optical waveguide fabrication method.

Method of fabricating planar optical waveguides in one chamber

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Seoul, South Korea

Jung-Hee Kim