Samsung Electronics Co., Ltd.

Seoul National University

Jung-Han Choi

Dong-Hyun Lee

Young-hwan Kim

Cheol-gyu Hwang

In-sang Song

Ji-Hoon Kim

Sung-Tae Choi

Hyun-Cheol Park

Young-Eil Kim

Young-Hwan Kim

Jae-Hyon Kim

Chang-won Jung

Chul-Soon Park

Dong-Yun Jung

Hong-Yi Kim

Young-woo Kwon

Yu-sung Lee

Ki-Chan Eun

Woo-yeol Choi

Seung-ho Hwang

Han-kil Lee

Jei-Young Lee

Disclosed are a beamformer and a beamforming method. The beamformer includes a plurality of dividers, each of which divides an input signal along a plurality of paths, an input switch which selects one of the dividers such that the input signal is input to the selected divider, a phase shifter which shifts phases of respective output signals from the divider, and an output switch which transmits the output signals from the phase shifter to an antenna.

Beamformer and beamforming method

A waveguide of a multi-layer metal structure and a manufacturing method thereof are provided, the method including applying a plurality of metal layers on a substrate and a plurality of insulating layers respectively between the respective metal layers. Accordingly, it is possible to minimize conductive loss by dispersing current uniformly through wide regions between a signal line and ground lines.

Multi-layer waveguide structure having spaced apart first and second signal units of different widths and heights

Provided is an Electromagnetic Bandgap (EBG) structure, particularly, a resonator and a bandpass filter having an overlay EBG structure, and a method of manufacturing the resonator. The resonator is manufactured by forming a transmission line and ground plates on a substrate, arranging a plurality of reflector units at regular intervals along the longitudinal direction of the transmission line, and removing at least one reflector among the plurality of reflectors, thus forming a common resonating mode. Therefore, since reflector units constructing capacitance components are separated from a substrate, it is possible to prevent electromagnetic waves from leaking out of the substrate and ensure a high Q characteristic in a high frequency environment due to a resonating unit formed between the reflector units.

Resonator and bandpass filter having overlay electromagnetic bandgap (EBG) structure, and method of manufacturing the resonator

A semiconductor element for macro and micro frequency tuning, and an antenna and a frequency tuning circuit having the semiconductor element, are provided. The semiconductor element includes first and second semiconductors which have a same polarity, a third semiconductor which has a polarity opposite to the polarity of the first and second semiconductors and is interposed between the first and the second semiconductors, a first intrinsic semiconductor which is interposed between the first and the third semiconductors, and a second intrinsic semiconductor which is interposed between the third and the second semiconductors.

Semiconductor for macro and micro frequency tuning, and antenna and frequency tuning circuit having the semiconductor

Provided is an electromagnetic bandgap (EBG) structure, and particularly, an overlay EBG structure in which a plurality of vias and a plurality of plates are formed at intervals on a central signal line in such a manner that the vias and plates extend vertically from a substrate in order to reduce leakage loss of an electromagnetic wave through the substrate. Therefore, it is possible to prevent an electromagnetic wave passing through a transmission line from being lost through the substrate, to obtain desired frequency characteristics by adjusting the dimensions of the vias and plates, and to manufacture the overlay EBG structure using an existing CMOS process without having to perform any additional process.

Overlay electromagnetic bandgap (EBG) structure and method of manufacturing the same

Provided is a switched beam-forming apparatus which includes a beam-forming unit forming a plurality of beams using an array antenna, a beam selection adjusting unit measuring Quality of Service (QoS) values of each of a plurality of signals received through the plurality of beams, a beam selecting unit selecting at least two beams with high QoS from among the plurality of beams according to the results of the QoS measuring, and a beam combining unit combining the at least two beams selected by the beam selecting unit.

Switched beam-forming apparatus and method using multi-beam combining scheme

Growing community of inventors

Hwaseong-si, South Korea

Jung-Han Choi