Industrial Technology Research Institute

Jung-Chen Chien

Tean-Mu Shen

Fu-Ching Tung

Muh-Wang Liang

Tsung-Hsin Lin

Ming-Shinn Liou

Chien-Chih Chen

Chih-Yung Huang

Chen-Der Tsai

Kuan-Chou Chen

Ching-Chiun Wang

Chia-Ming Chen

Ming-Hsin Liu

Jiun-Hung Chen

Pei-Shan Wu

Hong-Sheng Fang

Cheng-Chan Tsai

Yi-Jiun Lin

Jung-Chen Ho

Kung-Liang Lin

Chun-chien Chen

A solidifying device is for solidifying a substrate which includes a middle and two side portions. The thermostability of the middle portion is greater than that of the side portions. The solidifying device includes a housing, a heating member, a temperature control air-floating member and a conveyor. The housing defines a working space. The heating member is in the working space. The substrate has a heat receiving surface facing the heating member. The temperature control air-floating member is in the working space and below the heating member. The conveyor is for transporting the substrate into the working space and between the temperature control air-floating member and the heating member. The heating member is for providing heat to the substrate. The temperature control air-floating member is for supplying air towards the substrate to allow the substrate to float in the working space and form a high-temperature and two low-temperature areas.

Solidifying device

A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.

Film deposition apparatus having a peripheral spiral gas curtain

A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.

Cathode discharge apparatus

A multi-stage vacuum pump includes a plurality of casings connected in series and each casing defining a respective compression chamber, a plurality of partition plates each set in between each two casings. When compressed by rotors at shafts in one compression chamber, compressed air passes through the air path formed in the corresponding partition plate to the next compression chamber for further compression, and finally compressed air passes to the last compression chamber through the air path formed in the last partition plate. Because the invention is designed to let compressed air directly pass through the air path in each partition plate, the outer diameter and volume of the multi-stage vacuum pump can be minimized to reduce the weight and the manufacturing cost.

Multi-stage vacuum pump

A nozzle device for purging a vacuum pump includes a nozzle, the top portion of the nozzle is a tapered portion, two sides of the tapered portion are installed with nozzle holes for guiding the exhausted air sub-flow to be exhausted from the two sides of vent end.

Nozzle device for purging a vacuum pump

A multistage pump includes a shaft assembly and a housing and spacing plates. The shaft assembly completed by forming shafts and rotors integrally. The spacing plates defining a plurality of successive compression chambers, each chamber is delimited by two symmetrical spacing plates, there has a ring groove associated with the spacing plates, and having an elastic component placed. When the elastic component pressed by the housing, it became leakage and the clearance between the rotors and the spacing plates be easily controlled, by this way, the pump using parts are easy to manufacture, can be machined accurately and which enable highly accurate assembly to be achieved. As to the assembling method, which is characterized by mounting the high pressure end axial bearing seat and the high pressured end plate, then to control the clearance between the high pressure end plate of the bearing seat and the rotors. Furthermore, to install the spacing plates and the housing make the compression chamber formed.

Multistage pump and method for assembling the pump

Growing community of inventors

Jhubei, Taiwan

Jung-Chen Chien