Az Electronic Materials (luxembourg) S.a.r.l.

Jun Yamakawa

Takashi Fujiwara

Takashi Kanda

Hiroyuki Aoki

A copolymerized polysilazane comprising at least repeating units represented by general formula (I): &#x2014;Si(R)(R)&#x2014;NR&#x2014; and repeating units represented by general formula (II): &#x2014;Si(R)(R)&#x2014;NH&#x2014; (in the formulas, Rand Reach independently represent a hydrogen atom, hydrocarbon group, hydrocarbon group-containing silyl group, hydrocarbon group-containing amino group, or hydrocarbon oxy group, and Rrepresents an alkyl group, alkenyl group, alkoxy group, cycloalkyl group, aryl group or alkyl silyl group), and the NR/SiHratio (SiHrepresents the total amount of SiHand SiH) is 0.005-0.3. Said copolymerized polysilazane can be manufactured by reacting Si(R)(R)X(in the formula, X represents a halogen atom) with a primary amine compound: RNHand then reacting with ammonia, and is able to form a siliceous film that has withstand voltage characteristics and solvent resistance by curing at a low temperature.

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Kakegawa, Japan

Jun Yamakawa