Intevac, Inc.

Hillstone Networks Corp.

Jun Xie

Terry Bluck

Dongyi Jiang

Jin Shang

James H Rogers

David Yu

Ye Zhang

Michael Lin

Eric C Lawson

Mike Ji

A method performed by a network appliance having a plurality of application processing units, includes: receiving a first packet at the network appliance; calculating a first value using a mathematical algorithm based on one or more information regarding the first packet; and using the calculated first value to identify a first application processing unit of the plurality of application processing units in the network appliance. A network appliance includes: a plurality of processing units that are communicatively connected to each other; wherein a first processing unit of the plurality of processing units is configured for: calculating a first value using a mathematical algorithm based on one or more information regarding a first packet; and using the calculated first value to identify a second processing unit of the plurality of processing units.

Distributed network firewall and flow-based forwarding system

A method performed by a network system having a plurality of processing units implemented using a plurality of respective virtual machines, includes: receiving a first packet at a first virtual machine of the plurality of virtual machines, wherein the first virtual machine is configured to receive the first packet from a network through an interface and has session processing capability; calculating a first value using a mathematical algorithm based on one or more information regarding the first packet; and using the calculated first value to identify a second virtual machine of the plurality of virtual machines in the network system.

Distributed virtual security appliance and flow-based forwarding system using virtual machines

A disk gripper for gripping an insulating disk, such as a glass disk, at its edge during processing includes a contact device for contacting the edge of the insulating disk and a mechanism for moving the contact device between a contact position, in contact with the edge of the disk, and a retracted position. In a first processing station, a conductive coating is applied to a disk held by the gripper, with the contact device in the retracted position. In a second processing station, ions are generated in a plasma adjacent to the surface of the disk held by the gripper. The contact device is in the contact position in contact with the conductive coating, and a bias voltage is applied to the contact device in the second processing station. The ions are accelerated from the plasma toward the disk by the bias voltage applied to the conductive coating.

Methods and apparatus for processing insulating substrates

A substrate processing system includes a processing chamber, a substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source for energizing the ion source by positively biasing the anode and negatively biasing the cathode, the bias in each instance being relative to the chamber. The ion source ionizes the process gas producing ions for processing a substrate disposed on a substrate holder in the chamber. One embodiment includes two such ion sources. In this case, the power source energizes the first and second anodes and the cathodes in a time multiplexed manner, such that only one of the first or second ion sources is energized at any time and interactions between ion sources are eliminated.

Plasma processing system and method

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Sunnyvale, CA, United States of America

Jun Xie