Emc IP Holding Company LLC

Hoffmann-la Roche Inc.

Opple Lighting Co., Ltd.

Micron Technology Incorporated

Maxim Integrated Products, Inc.

Morgan Stanley Services Group Inc.

Huawei Technologies Co., Limited

Koninklijke Philips Corporation N.v.

Honeywell International Inc.

Sap Se

L'oreal

Mstar Semiconductor, Inc.

Rigel Pharmaceuticals, Incorporated

Ademco Inc.

F. Hoffmann-la Roche Ag

Jun Wu

Hui Wang

Xuefei Tan

Yongfu Liu

Dong Pan

Bernd Kuhn

Johannes Aebi

Rainer Eugen Martin

Alexander Mayweg

Hans Peter Maerki

Benoit Hornsperger

Kurt E Amrein

Haitao Zhou

Xi Wang

Fuping Chen

Lisha Wang

Yu Zhang

Jian Wang

Yuan Chen

Shuo Lv

Ying Luo

Lester Zhang

Chungen Liang

Song Feng

Zhixian Zhou

Xinlei Xu

Jun Wang

Yi Bin Wang

Wei Wang

Liang Li

Junping Zhao

Muzhar S Khokhar

Johan Hendrik Huijsing

Hong Shen

Lei Zhou

Yan Mei Zhang

Li Wang

Zhaowei Jia

Fufa Chen

Ting Li

Xiao Min Xu

Yang Shi

Jie Liu

Dongbo Li

Qiaosheng Zhou

Wilson Guoyu Hu

Cheng Cheng

Minqiang Wu

Eric Wu

Weigang Zhu

Daihong Fu

Zhiyou Fang

Hongchao Yang

Wenjun Wang

Kenneth Wood

Larry Baoqi Li

Michael G Varteresian

Min Jiang

Yourong Wang

Zhijun Li

Bean Bin Zhao

Yalong Liu

Zhenghua Zhang

Rongfeng Zhou

Zhenming Chu

Hongliang Wang

Jack Suzuki

Chao Li

Mingwei Zhou

Zhenhua Huang

Dongdong Chen

Xuejun Li

Jianping Wang

Song Li

Kofi Afolabi Anthony Makinwa

Shena Jia

Zhigang Lu

Jin Fu

Haitao Jiang

Junli Chen

Helena S Mancebo

Zhibing Zhai

X Charlene Liao

Jiajie Sun

Weiyi Cui

Wenming Chen

Yekun Gao

Haojie Zhang

Jianhua Yu

Qinwen Fan

Rongfang Wang

Guanzhong Lu

Qing Jiang

Zihao Jiang

Yifan Liu

Zhaofeng Zhang

Xubin Lu

Deyun Wang

Jiamin Situ

A system and method for updating network policies may include determining, from a set of hosts, a subset of hosts to have network policies updated; for each host in the subset of hosts, determining a set of policies relevant to the host, and determining a difference between the set of policies relevant to the host and a set of policies relevant to the host determined at an earlier time; and for each of the subset of hosts, installing the set of policies relevant to the host. The difference may be calculated or determined by comparing a file containing the set of policies relevant to the host, and a file containing the set of policies relevant to the host determined at an earlier time, e.g. determined the prior calendar day.

System and method for firewall policy rule management

The present invention relates to a method for inhibiting biogenic hydrogen sulfide in oilfields. A synergistic inhibition system combination agent containingstrain GW1 is added into oilfield systems, wherein the strain GW1 has been deposited in China General Microbiological Culture Collection Center on Oct. 20, 2021, and has the deposit number of CGMCC No. 23631.

Method for inhibiting biogenic hydrogen sulfide in oilfields

Method and apparatus for recommending at least one of a makeup palette or a hair coloration scheme are provided. The method comprises extracting a color set of at least one region of a digital image associated with a user (); generating color recommendation information for at least one of a makeup palette or a hair coloration scheme for at least two other regions of the digital image associated with the user based on one or more inputs indicative of the extracted color set (); and generating one or more instances of a virtual representation of a makeup palette recommendation or a hair coloration scheme recommendation based on the color recommendation information ().

Computing device, method and apparatus for recommending at least one of a makeup palette or a hair coloration scheme

Bioreactor

A system and method may update network policies by determining, among a set of hosts, a subset of hosts to have network policies updated; for each host in the subset of hosts, determining a set of policies relevant to the host; and for each of the subset of hosts, installing the set of policies relevant to the host. The subset of hosts may be determined based on a category or division such as the time zone corresponding to the location of each host in the subset of hosts. The policies relevant to the host may be received from a database and saved to a file with the set of policies relevant to the host; the host may then access the file.

Presented herein are systems and methods for an access control system deployable in an IT Infrastructure System (enterprise) to automatically discover an unmanaged IT asset or resource based on registration metadata stored in a CMDB; in response to discovery of the unmanaged IT resource, generating based on the registration metadata, in an LDAP server of the enterprise, an entitlement for one or more groups of enterprise users, wherein, for each of the one or more users or groups, the entitlement is embodied in an LDAP group name, wherein the LDAP group name is determined based on IT resource application metadata and/or on a pre-defined LDAP group naming convention; and mapping, based on the LDAP group name, the entitlement for each of the one or more users or groups to one or more specified target IT assets of the enterprise already registered, including software applications, or hardware including databases or servers.

Centralized technology access control

The invention provides an apparatus for cleaning semiconductor wafers. The apparatus includes at least one first tank, containing cleaning chemical, configured to implement batch cleaning process; one or more second tanks, containing cleaning liquid, configured to implement batch cleaning process; one or more single wafer cleaning modules, configured to implement single wafer cleaning and drying processes; a plurality of robots, configured to transfer one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules; and a controller, configured to control the plurality of robots to transfer the one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules.

Apparatus and method for cleaning semiconductor wafers

The examples of the disclosure disclose measurement method and device of light source parameters, an illumination system and a terminal apparatus. The method includes: collecting signal values of a light source to be measured from a color sensor, the color sensor including at least six response channels; preprocessing the signal values that have been collected, the preprocessing including normalization processing and standardization processing; constructing model features according to the signal values that have been preprocessed, and determining a light source type of the light source to be measured according to the model features; inputting the model features and the light source type that has been determined into a color rendering index prediction model to obtain a color rendering index of the light source to be measured.

Measurement method and device of light source parameters, illumination system and terminal apparatus

The present invention provides flavone derivatives having the general formula (I) which are useful for the treatment of Hepatitis B Virus infection (HBV). The compounds act as cccDNA (covalently closed circular DMA) inhibitors.

Flavone compounds for the treatment and prophylaxis of hepatitis B virus disease

The present invention provides novel compounds having the general formula (I) wherein Rto R, and m are as described herein, compositions including the compounds and methods of using the compounds.

Chromen-4-one derivatives for the treatment and prophylaxis of hepatitis B virus disease

The disclosure provides a method and a system for adjusting an irradiation angle of a lamp and a lamp with adjustable irradiation angle. The lamp includes a plurality of infrared receivers and a driving motor. The method comprises: receiving an infrared signal from a remote controller via the plurality of infrared receivers; determining an irradiation angle adjustment value of the lamp based on a plurality of infrared signal intensity values of the plurality of infrared receivers; adjusting an irradiation angle of the lamp via the driving motor based on the irradiation angle adjustment value. In the technical scheme provided by the example of the disclosure, when the irradiation angle of the lamp needs to be adjusted, the irradiation angle of the lamp is controlled only by operating the remote controller.

Irradiation angle adjustment method and system of lamp and lamp with adjustable irradiation angle

A detection circuit, a method for detecting light source flicker, a device for detecting light source flicker, and a photoelectric detection device are provided by the examples of the present disclosure, and the detection circuit includes a power supply; a photodiode configured to output a current based on a light source; a driving circuit connected in series with the photodiode and configured to generate an output voltage based on the current output by the photodiode, a current output by the power supply, and a resistive component, the driving circuit includes a plurality of circuits with different illumination correlation coefficients; and a control unit connected with the driving circuit and configured to select a circuit with a matched illumination correlation coefficient from the driving circuit to control the output voltage within a designate voltage range.

Detection circuit, device and method for detecting light source flicker, and photoelectric detection device

A quick-fitting pipe fitting for connecting at least one pipeline element comprises a pipe fitting body. The pipe fitting body is configured with a pre-installation section, and the pre-installation section is movably connected with a pipe clamp assembly. The pipe clamp assembly comprises at least two movable clamp parts and at least one fastener, and the fastener is configured to be operated to fasten the two movable clamp parts. At least one sealing ring is arranged in the pipe clamp assembly.

Quick-fitting pipe fitting

The present invention provides a substrate heat treatment apparatus for heat treating a substrate, including a bake plate, support components, a baffle plate, and a driving device. The bake plate defines at least one gas passage. The support components support the substrate. The baffle plate is fixed on a top surface of the bake plate. The baffle plate surrounds the substrate and a gap is formed between an inner circumferential wall of the baffle plate and the substrate. A driving device drives the plurality of support components to move up or down. When heat treating the substrate, a hot gas is supplied to the space between the substrate and the top surface of the bake plate through the gas passage of the bake plate, and the hot gas flows out through the gap formed between the inner circumferential wall of the baffle plate and the substrate.

Substrate heat treatment apparatus

Apparatuses, systems, and methods for refresh modes. A memory may need to perform targeted refresh operations to refresh the 'victim' word lines which are near to frequently accessed 'aggressor' word lines. To refresh the victims at a high enough rate, it may be desirable to refresh multiple victims as part of the same refresh operation. However, certain word lines (e.g., word lines in a same section or adjacent sections of the memory) cannot be refreshed together. The memory may have a section comparator, which may check stored aggressor addresses and may provide a signal if there are not two stored addresses which can be refreshed together. Based, in part, on the signal, the memory may activate one of several different refresh modes, which may control the types of refresh operation performed responsive to a refresh signal.

Refresh modes for performing various refresh operation types

Growing community of inventors

Shanghai, China

Jun Wu