Shin-etsu Chemical Co., Ltd.

Fujitsu Corporation

Other

The Institute of Physical and Chemical Research

Canon Kabushiki Kaisha

Matsushita Electric Industrial Co., Ltd.

Fuji Photo Film Company, Limited

Nippon Telegraph and Telephone Corporation

Tungaloy Corporation

Toshiba Storage Device Corporation

Sony Corporation

Central Glass Company, Limited

Shin-estu Chemical Co., Ltd.

Jun Watanabe

Jun Hatakeyama

Yuji Harada

Youichi Ohsawa

Yoshio Kawai

Masaru Sasago

Shinji Kishimura

Takanobu Takeda

Hisayoshi Ohba

Masayuki Endo

Shigehiro Nagura

Kazuhiko Maeda

Satoru Miyazawa

Michitaka Ootani

Kentaro Tsutsumi

Osamu Watanabe

Toshinobu Ishihara

Satoshi Watanabe

Mutsuo Nakashima

Akinobu Tanaka

Isao Endo

Takeshi Nagata

Akihiro Seki

Tsunehiro Nishi

Katsuya Takemura

Minoru Takamizawa

Tomohiro Kobayashi

Kazunori Maeda

Fujio Yagihashi

Yoshiharu Kasamatsu

Kaname Inoue

Tadahito Matsuda

Takayuki Musashi

Yohei Sone

Takeshi Kinsho

Keiji Watanabe

Tohru Kubota

Norikazu Nakamura

Ichiro Amimori

Tomoyoshi Furihata

Kohei Arakawa

Eishin Yamakawa

Hideaki Yamauchi

Wataru Kusaki

Hiroshi Chiba

Atsushi Totsuka

Yoshiko Iida

Shigeo Kobayashi

Tohru Chiba

Koh Kamada

Akihiro Ikeyama

Hiroshi Ban

Toshiaki Takahashi

Yukiko Oshikubo

Kenichi Nakamura

Hiroshi Miyoshi

Hideaki Miyahara

Kenji Hashimoto

Kenji Koizumi

Akira Ohta

Fujio Yagihasi

Takeshi Toukairin

Hiroko Kozono

Matsuo Nakashima

Haruko Hosozawa

Okmi Park

Nishi Tsunehiro

An image processing apparatus comprises: a white balance correction unit configured to perform a white balance correction by amplifying at least one color signal in relation to mosaic image data; a compression unit configured to compress the mosaic image data; and a control unit configured to control at least the white balance correction unit and the compression unit, wherein the control unit in a case where compression by the compression unit is set to be off, controls the white balance correction to be substantially invalid, and outputs the mosaic image data, and in a case where compression by the compression unit is set to be on, controls the white balance correction to be valid, and outputs the mosaic image data after the white balance correction.

Image processing apparatus, image processing method, and storage medium

Provided is an image processing apparatus capable of adjusting a color of an image of an observation target depending on differences between viewing angles. The image processing apparatus obtains a viewing angle of a first observation target and a viewing angle of a second observation target, and then corrects the color of each observation target by using the obtained viewing angles of the first and second observation targets.

Image processing apparatus and image processing method with color correction of observation target

Provided are a coated cutting tool having excellent wear resistance and excellent resistance to chipping as well as excellent fracture resistance such that the coated cutting tool is unlikely to cause backward movement of the tool edge position due to wear or chipping, and a method for producing the same. A coated cutting tool comprising a base material having a surface coated with a coating film, wherein the coating film comprises at least one layer comprised of a TiCN columnar crystal film, wherein the TiCN columnar crystal film has an average grain size of 0.05 to 0.5 &#x3bc;m, as measured in the direction parallel to the surface of the base material, and exhibits an X-ray diffraction pattern having a peak at a diffraction angle 2&#x3b8; in the range of from 121.5 to 122.6&#xb0; wherein the peak is ascribed to the (422) crystal facet of the TiCN columnar crystal as measured using CuK&#x3b1; radiation.

Coated cutting tool and method for producing the same

A magnetic storage device includes a magnetic disk having a protective film and a lubricant layer formed on the protective film, a head stack assembly including a head operable to read information from and write information to the magnetic disk, and a suspension configured to support the head, a vibration detection sensor operable to output a detection signal to detect vibration of the head stack assembly, and an extraction unit operable to extract a specific frequency range from the detection signal outputted by the vibration detection sensor, the specific frequency range including a natural frequency of the head stack assembly but not including a natural frequency of an air film on the head.

Magnetic storage device and contact detection method

A magnetic head used in a lamp load type magnetic disk device is disclosed. The magnetic head includes a head slider having a recording element and/or a reproducing element, and a suspension that supports the head slider. The suspension includes a magnetic head support unit arranged at its tip portion. The magnetic head support unit comes into contact with a lamp unit of the magnetic disk device when at least one of magnetic head loading operations and magnetic head unloading operations are performed and has a surface on which a lubricating layer is formed.

Magnetic head, method of manufacturing the magnetic head, and magnetic disk device

A head slider to which little amount of contaminants is adhered, that can form a uniform and flat head lubricant layer surface and that has excellent ultra-low floating properties, as well as a magnetic recording device equipped with the head slider are provided. The head slider is equipped with a head slider lubricant layer having an average film thickness of not more than 2.5 nm, and composed of a water-repellent resin, the lubricant layer being formed on the head slider surface and head slider protection layer surface facing the magnetic recording medium, and the surface tension of the head slider lubricant layer determined by the Fowkes equation is not more than those of the head slider surface and head slider protection layer surface.

Magnetic recording device having a head slider utilizing a water-repellant resin lubricant having specified surface tension properties

A method and computer program for generating a capacitance value rule table, which simplifies generation of the capacitance value rule table for multilayer wiring having a complex dielectric constant structure are provided. In the method, construction data of wire adjacent to a wire of interest is extracted (S), a common dielectric constant for a plurality of insulating film in the construction data is calculated (S), and capacitance value rule table (F) is created based on the common dielectric constant (s).

Method of generating capacitance value rule table for extraction of wiring capacitance and capacitance value rule table generation program

The invention provides a polyester block copolymer composition (R) obtained by thermally-processing a polyester block copolymer composition (Q) obtained by melt-mixing 100 parts by weight of a polyester block copolymer (P) with 0.1&#x2013;5 parts by weight of an epoxy compound (C) having one or more epoxy groups under an inert gas atmosphere and not less than 102&#xb0; C. in a solid phase, and further, at a temperature lower than a melting point of the polyester block copolymer composition (R) obtained.

Polyester block copolymer composition and process for the preparation thereof

A method and program for capacitance extraction enabling reduction of the need for division into segments during extraction of capacitances in an LSI device having diagonal wires, so that increases in the number of processes for capacitance extraction can be suppressed are provided. In the method and program, a wire model is generated in which, for a wire segment such that the wire of interest and an adjacent wire are not parallel, either the wire of interest or the adjacent wire is replaced so as to be parallel to the other, and the capacitance of the wire of interest is extracted for this wire model, so that the number of processes in the capacitance extraction process can be reduced.

Method of extraction of wire capacitances in LSI device having diagonal wires and extraction program for same

A method for designing a semiconductor device in which dummy pattern density and design pattern density are equalized on the entire semiconductor chip. A layout pattern for a layout layer in a semiconductor device is divided into divided areas (step S1). A dummy pattern is inserted between design patterns in the divided areas obtained by dividing the layout pattern (step S2). Dummy pattern density and design pattern density in each divided area are calculated (step S3). Pattern rules for a dummy pattern in each divided area are changed so that the dummy pattern density and the design pattern density will be desired values (step S4).

Method, program, and apparatus for designing a semiconductor device

A semiconductor-device design method considering change in capacitance between wiring patterns due to an inserted dummy pattern. An information reception part receives dummy rule information about rules for dummy patterns and process information about wiring structure of wiring patterns. A capacitance calculation part calculates a capacitance value for each of wiring distances between the wiring patterns defined by the process information, under the condition that a dummy pattern defined by the dummy rule information is inserted between the wiring patterns. A wiring-pattern capacitance calculation part calculates capacitance values between wiring patterns of an intended semiconductor device defined by layout data stored in a layout database, referring to the capacitance values calculated by the capacitance calculation part. Thus, a semiconductor device considering change in capacitance between wiring patterns due to an inserted dummy pattern is designed.

Semiconductor-device design method, semiconductor-device design program and semiconductor-device design apparatus

There is disclosed an anti-reflection film comprising 5-65% by volume of inorganic fine particles having an average particle size of 1-200 nm and having a core/shell structure, and 35-95% by volume of a polymer, wherein a high-refractive-index layer having a refractive index of 1.65-2.40 and a low-refractive-index layer having a refractive index of 1.30-1.55 are laminated. There is also disclosed a polarizing plate and image display device utilizing the anti-reflection film. The anti-reflection film is suitable for mass production.

Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate

Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of Fexcimer laser light are obtained.

Polymer, chemically amplified resist composition and patterning process

A base polymer having incorporated an ester group having a fluorinated alicyclic unit is provided. A resist composition comprising the polymer is sensitive to high-energy radiation, and has excellent sensitivity at a wavelength of less than 200 nm, significantly improved transparency by virtue of the fluorinated alicyclic units incorporated as well as satisfactory plasma etching resistance. The resist composition has a low absorption at the exposure wavelength of a Flaser and is ideal as a micropatterning material in VLSI fabrication.

Polymers, resist compositions and patterning process

Growing community of inventors

Nakakubiki-gun, Japan

Jun Watanabe