Shimadzu Corporation

Dainippon Screen Mfg. Co., Ltd.

Screen Holdings Co., Ltd.

Shimane University

National Institute for Environmental Studies

Jun Watanabe

Kazuhiko Fuse

Takahiro Yamada

Makoto Abe

Shinji Miyawaki

Kenichi Yokouchi

Manabu Ueda

Shunji Tomatsu

Takashi Sumiyoshi

Toshihiro Nakajima

Takanari Hattori

Toshikazu Minohata

Shoji Nakayama

Misa Tanaka

Tetsuo Iida

Hironori Kobayashi

Provided is a method by which the disaccharides derived from glycosaminoglycans can be analyzed in a stable and highly reproducible manner. A method for analyzing a glycosaminoglycan according to the present invention includes: a first process for producing a plurality of kinds of disaccharides derived from a glycosaminoglycan in a biological sample by adding a plurality of kinds of glycosaminoglycan-specific enzymes to the biological sample; and a second process for separating and analyzing the plurality of kinds of disaccharides by a liquid chromatography-mass spectrometry method, where a column used for liquid chromatography in the liquid chromatography-mass spectrometry method is a column packed with a stationary-phase support to which an amide group as a functional group is bound, or a column packed with a stationary-phase support to which an adamantyl group as a functional group is bound.

Method for analyzing glycosaminoglycan

A ring support is attached to an inner wall surface of a chamber that houses a semiconductor wafer to support a susceptor. When the semiconductor wafer is placed on the susceptor, an inner space of the chamber is separated into an upper space and a lower space. Particles are likely to accumulate on a lower chamber window as a floor part of the chamber. However, since the upper space and the lower space are separated, the semiconductor wafer can be prevented from being contaminated by the particles flowing into the upper space and adhering to a surface of the semiconductor wafer even when the particles on the lower chamber window are blown up by irradiation with flash light.

Light-irradiation thermal treatment apparatus

In an LC/MS/MS analysis: injecting a sample into a passage leading to a column group provided in a liquid chromatograph, the column group including a plurality of columns serially connected to each other and packed with different kinds of packing materials; supplying an eluant to one or a plurality of columns including a column located most downstream, to separate a portion of the target components in the sample in the one or plurality of columns, and sequentially elute those components from the most downstream column to perform mass spectrometry; and supplying a different eluant to one or a plurality of columns including the most downstream column, to separate at least a portion of the target components which stayed uneluted in the one or plurality of columns in the first analysis step, and sequentially elute those components from the most downstream column to perform mass spectrometry.

Method for analyzing sample by liquid chromatograph mass spectrometry

The detection of minute amounts of components that have been undetectable due to an influence of a mobile phase or reagents or the like added to the mobile phase is realized in LC-MS. At the outset, blank measurement is executed, and an m/z value Mof a background signal derived from a mobile phase or the like is extracted on a mass spectrum obtained by the blank measurement (S-S). An analysis method is then created that executes scanning measurement in a plurality of divided m/z ranges in which the m/z value Mof the background signal has been excluded from a predetermined m/z range. An LC/MS analysis of the target sample is executed according to the analysis method (S-S). When a total ion chromatogram (TIC) is created from data obtained by the LC/MS analysis, influence of the background signal hardly appears in the TIC, and the base line is lowered.

Analysis device

In the case where a peak on a mass spectrum is saturated due to, for example, signal saturation in a detector or an amplifier provided downstream thereof, a data processor performs fitting with a Gaussian function using data included in the rising part and the falling part (range A) of the peak which are not affected by the saturation, to thereby obtain a desired approximate peak shape B. Then, a mass spectrum in which the saturated peak is replaced with the approximate peak thus obtained is created, the mass-to-charge ratio of the peak top is calculated for this mass spectrum, and this mass spectrum is then displayed on a display screen. Moreover, an extracted ion chromatogram is created on the basis of information on mass-to-charge ratio to intensity of this modified mass spectrum and displayed.

Mass analysis data processing apparatus

In a heat treatment apparatus, a reflector is provided to cover a plurality of flash lamps arranged in an array for emitting a flash of light, and a cooling box is provided over the reflector. The cooling box has a buffer space incorporated therein, and a plurality of jet openings in communication with the buffer space are formed through a bottom surface of the cooling box and the reflector. The plurality of jet openings are positioned just over gaps between the plurality of flash lamps in the lamp array. Nitrogen gas ejected from the plurality of jet openings passes through the gaps between adjacent ones of the flash lamps in the lamp array, and is then blown against a lamp light radiation window. The flash lamps are effectively cooled down by the direct cooling using the nitrogen gas and the decrease in temperature of the lamp light radiation window.

Heat treatment apparatus which emits flash of light

In a heat treatment apparatus, a holding part moves upwardly to receive a semiconductor wafer transported into a chamber and placed on support pins. The semiconductor wafer held in close proximity to a light-transmittable plate by the holding part is preheated by a hot plate, and is then flash-heated by a flash of light emitted from flash lamps. Thereafter, the holding part moves downwardly to transfer the semiconductor wafer to the support pins, and the semiconductor wafer is transported out of the chamber. Then, a new semiconductor wafer is transported into the chamber. The holding part is adapted to perform such a series of operations of moving upwardly and downwardly also when in a standby condition pending the transport of the first semiconductor wafer in a lot into the chamber.

Heat treatment apparatus and heat treatment method

Growing community of inventors

Kyoto, Japan

Jun Watanabe