Nikon Corporation

Jun Takano

Hiroki Jinbo

Hiroyuki Hiraiwa

Seishi Fujiwara

Kazuhiro Nakagawa

Norio Komine

Issey Tanaka

Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

Silica glass member for UV-lithography, method for silica glass

Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.

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Sagamihara, Japan

Jun Takano