Molecular Imprints, Inc.

Canon Nanotechnologies, Inc.

Jun Sung Chun

Frank Y Xu

Michael P C Watts

A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO, partially condensed alkoxysilanes, organically modified silicates having the composition RSiOand RSiO, and partially condensed orthosilicates having the composition SiOR, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.

Growing community of inventors

Austin, TX, United States of America

Jun Sung Chun