Samsung Electronics Co., Ltd.

Osong Medical Innovation Foundation, Korea University Research and Business Foundation

Jun-seong Kim

Chang-seung Lee

Ki-deok Bae

Euk-che Hwang

Sang-Yoon Lee

Myung-Kwan Ryu

Kyung-bae Park

Tae-sang Kim

Jang-yeon Kwon

Ji-sim Jung

Kyung-Seok Son

Yong-sung Kim

Hyeon-jin Shin

Masataka Hamada

Chang-youl Moon

Joo-ho Lee

Chang-su Kim

Kazuhiko Sugimoto

Jong-hoon Won

Sung-Woong Kim

Wou-sik Kim

In-sung Song

A method of generating a saliency image, which includes: converting an input image into an input image of the first size and an input image of the second size; applying a saliency extraction scheme to the input image of the first size to generate a first saliency image; converting the first saliency image to the second size; extracting an area that satisfies a first condition from the converted first saliency image; determining an area of the input image of the second size that corresponds to the extracted area; and generating a second saliency image by multiplying an image generated by applying the saliency extraction scheme to the determined area, and the converted first saliency image.

Method and apparatus for generating hierarchical saliency images detection with selective refinement

Transistors and methods of manufacturing the same may include a gate on a substrate, a channel layer having a three-dimensional (3D) channel region covering at least a portion of a gate, a source electrode over a first region of the channel layer, and a drain electrode over a second region of the channel layer.

Transistors and methods of manufacturing the same

Wire grid polarizers, methods of fabricating a wire grid polarizer and display panels including a wire grid polarizer are provided, the methods include preparing a mold having a lower surface in which a plurality of parallel fine grooves are formed, and arranging the mold on a transparent substrate. The plurality of parallel fine grooves are filled with a conductive liquid ink. A plurality of parallel conductive nano wires are formed on the transparent substrate by curing the conductive liquid ink. The mold is removed.

Wire grid polarizers, methods of fabricating a wire grid polarizer, and display panels including a wire grid polarizer

A ZnO-based thin film transistor (TFT) is provided herein, as is a method of manufacturing the TFT. The ZnO-based TFT has a channel layer that comprises ZnO and ZnCl, wherein the ZnCl has a higher bonding energy than ZnO with respect to plasma. The ZnCl is formed through the entire channel layer, and specifically is formed in a region near the surface of the channel layer. Since the ZnCl is strong enough not to be decomposed when exposed to plasma etching gas, an increase in the carrier concentration can be prevented. The distribution of ZnCl in the channel layer, may result from the inclusion of chlorine (Cl) in the plasma gas during the patterning of the channel layer.

ZnO-based thin film transistor and method of manufacturing the same

Provided are a thin film transistor for display devices and a manufacturing method of the thin film transistor. The thin film transistor for display devices includes: a flexible substrate; a gate electrode layer formed on the flexible substrate; a first insulating layer formed on the flexible substrate and the gate electrode; a source and a drain formed on the first insulating layer; an active layer formed on the first insulating layer between the source and the drain; a second insulating layer formed on the first insulating layer, the source, the drain, and the active layer; and a drain electrode that opens the second insulating layer to be connected to the drain and is formed of a CNT dispersed conductive polymer.

Thin film transistor for display device including a dispersed carbon nanotube dispersed conductive polymer and manufacturing method of the same

A ZnO-based thin film transistor (TFT) is provided herein, as is a method of manufacturing the TFT. The ZnO-based TFT has a channel layer that comprises ZnO and ZnCl, wherein the ZnCl has a higher bonding energy than ZnO with respect to plasma. The ZnCl is formed through the entire channel layer, and specifically is formed in a region near THE surface of the channel layer. Since the ZnCl is strong enough not to be decomposed when exposed to plasma etching gas, an increase in the carrier concentration can be prevented. The distribution of ZnCl in the channel layer, may result from the inclusion of chlorine (Cl) in the plasma gas during the patterning of the channel layer.

A method of fabricating a black matrix of a color filter is provided. In the method, a black matrix layer formed of a hydrophobic organic material is formed on an upper surface of a transparent substrate. A black matrix is formed by patterning the black matrix layer. Side surfaces of the black matrix are made hydrophilic by irradiating a lower surface of the transparent substrate with ultraviolet rays while heating the black matrix. A black matrix provided by the method is also disclosed.

Method of fabricating black matrix of a color filter

Growing community of inventors

Hwaseong-si, South Korea

Jun-seong Kim