Jsr Corporation

Jun Numata

Eiichi Kobayashi

Tsutomu Shimokawa

Tomoki Nagai

Masafumi Yamamoto

Toru Kajita

Masaaki Miyaji

Hiroyuki Ishii

Yukio Nishimura

Yuji Yada

Shirou Kusumoto

Yong Wang

Kiyoshi Murata

Mikio Yamachika

Akimasa Soyano

Norihiro Natsume

Hiromichi Hara

Aki Suzuki

Takashi Chiba

A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein Ris a hydrogen or methyl, Ris a Ctertiary alkyl, Rand Rare a hydrogen, Calkyl, Caromatic, Calkoxyl, or Rand Rmay form, in combination and together with the nitrogen atom with which the Rand Rgroups bond, a Ccyclic structure, provided that Rand Rare not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

Radiation-sensitive resin composition

A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1),wherein Ris a hydrogen or methyl, Ris a Ctertiary alkyl, Rand Rare a hydrogen, Calkyl, Caromatic, Calkoxyl, or Rand Rmay form, in combination and together with the nitrogen atom with which the Rand Rgroups bond, a Ccyclic structure, provided that Rand Rare not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

A carbazole derivative of the following formula (1),wherein Rand Rindividually represent a hydrogen atom or a monovalent organic group, or Rand Rform, together with the carbon atom to which Rand Rbond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and Rrepresents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

Carbazole derivative and chemically amplified radiation-sensitive resin composition

A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.

N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same

A radiation-sensitive resin composition exhibiting high sensitivity to various types of radiation and capable of forming a minute pattern with sufficient resolution and depth of field and small surface roughness in various types of patterns such as a dense line pattern, isolated line pattern, or contact holes, particularly in line-type patterns. The resin composition comprises (A) an aromatic sulfonic acid onium salt compound consisting of a 2,4-difluorobenzenesulfonic acid anion, 4-trifluoromethylbenzenesulfonic acid anion, or 2-trifluoromethylbenzenesulfonic acid anion, and an onium cation of sulfur or iodonium, and (B) a copolymer represented by a 4-hydroxystyrene/4-t-butoxystyrene copolymer and a 4-hydroxystyrene/4-(1&prime;-ethoxyethoxy)styrene copolymer.

A radiation-sensitive resin composition comprising (a) a resin represented by a copolymer of p-hydroxystyrene and t-butyl (meth)acrylate and a copolymer of p-hydroxystyrene and p-t-butoxystyrene, (b) a photoacid generator, and (c) a quaternary ammonium salt compound represented by tetramethylammonium adamantanecarboxylate, tetramethylammonium oxalate, tetraethylammonium pyruvate. The radiation-sensitive resin composition is capable of producing a rectangular resist pattern while preventing the top edge of the pattern from rounding, which is a big problem in microprocessing of design dimensions of about 0.20 &mgr;m with a thin film. The radiation-sensitive resin composition is highly sensitive to deep ultraviolet radiation, X-rays, and charged particle rays and exhibits excellent sensitivity, resolution, and the like.

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Mie, Japan

Jun Numata