Shibaura Mechatronics Corporation

Jun Matsushita

Konosuke Hayashi

Osamu Yamazaki

Kunihiro Miyazaki

Takashi Miyamoto

Yuji Nagashima

A substrate processing devicehas a water removing unitand, when a solvent supply unitsupplies a volatile solvent to a surface of a substrate W, the water removing unitsupplies a water removing agent to the surface of the substrate W to promote replacement of the cleaning water on the surface of the substrate W with the volatile solvent.

Substrate processing device and substrate processing method

The substrate processing unitcomprises the rotating tableconfigured to hold substrate W, the processing chamberwhich accommodates the rotating table, a lampis provided above the processing chamberand configured to heat the surface of substrate W, the lamp chamberwhich accommodates that lamp, a transmission windowdisposed below the lamp chamber, and a plurality of nozzlewhich supply cooling fluid G to the transmission window. Then the substrate processing unitcan suppress generating of a water mark or pattern collapse, and can perform good substrate processing.

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Yokohama, Japan

Jun Matsushita