Rockwell Science Center, Inc.

Rockwell Automation Technologies Incorporated

Rockwell Technologies, Inc.

Rockwell International Corporation

Teledyne Scientific and Imaging, LLC

Teledyne Technologies Incorporated

Teledyne Licensing, LLC

Jun Jason Yao

David R Pehlke

James L Bartlett

Charles W Seabury

Deepak Mehrotra

Kenneth D Pedrotti

Henry O Marcy, 5th

Robert J Anderson

Mau Chung Chang

J L Tham

Gerard Sullivan

Robert J Kretschmann

Jeffrey R Annis

Richard D Harris

Patrick C Herbert

Winfred L Morris

Sangtae Park

J L Julian Tham

Henric Larsson

Mau Chung F Chang

Jeffrey DeNatale

Philip Stupar

Robert L Borwick, Iii

J Aiden Higgins

Gerard J Sullivan

Henry O Marcy, 5supth

Jl Julian Tham

Robert E Mihailovich

A signal-carrying flexure structure for a MEM device comprises at least two conductive flexure segments having respective cross-sectional areas, and at least one crosspiece affixed to the flexure segments to operatively couple the segments together such that the flexure segments and crosspiece form a single flexure structure. The resulting flexure structure's spring constant is less than that of a solid flexure having a comparable total cross-sectional area, while its resistance is approximately equal to that of the solid flexure.

Signal-carrying flexure structure for micro-electromechanical devices

A shielded through-via that reduces the effect of parasitic capacitance between the through-via and surrounding wafer while providing high isolation from neighboring signals. A shield electrode is formed in the insulating region and spaced apart from the through-via. A coupling element couples at least the time-varying portion of the signal carried on the through-via to the shield electrode. This reduces the effect of any parasitic capacitance between the through-via and the shield electrode, hence the surrounding wafer.

Shielded through-via

A process for fabricating a MEMS device comprises the steps of depositing and patterning on one side of a wafer a layer of material having a preselected electrical resistivity; bonding a substrate to the one side of the wafer using an adhesive bonding agent, the substrate overlying the patterned layer of material; selectively removing portions of the wafer from the side opposite the one side to define stationary and movable MEMS elements; and selectively removing the adhesive bonding agent to release the movable MEMS element, at least a portion of the layer of material being disposed so as to be attached to the movable MEMS element.

Method for fabricating microelectromechanical system (MEMS) devices

In a MEMS device employing a beam supported by transverse arms, potential bowing of the transverse arms caused by fabrication processes, temperature or local self-heating from resistive losses is accommodated by flexible terminations of the transverse arms. Alternatively, this bowing is controlled so as to provide selective biasing to the beam or mechanical advantage in the sensing of beam motion.

Microelectricalmechanical system with improved beam suspension

Microelectromechanical system (MEMS) with improved beam suspension

The present invention relates to a fabrication process relating to a fabrication process for manufacture of micro-electromechanical (MEM) devices such as cantilever supported beams. This fabrication process requires only two lithographic masking steps and offers moveable electromechanical devices with high electrical isolation. A preferred embodiment of the process uses electrically insulating glass substrate as the carrier substrate and single crystal silicon as the MEM component material. The process further includes deposition of an optional layer of insulating material such as silicon dioxide on top of a layer of doped silicon grown on a silicon substrate. The silicon dioxide is epoxy bonded to the glass substrate to create a silicon-silicon dioxide-epoxy-glass structure. The silicon is patterned using anisotropic plasma dry etching techniques. A second patterning then follows to pattern the silicon dioxide layer and an oxygen plasma etch is performed to undercut the epoxy film and to release the silicon MEM component. This two-mask process provides single crystal silicon MEMs with electrically isolated MEM component. Retaining silicon dioxide insulating material in selected areas mechanically supports the MEM component.

Process for manufacture of micro electromechanical devices having high electrical isolation

A current sensor includes a deflectable member disposed in a magnetic field. Nulling or compensating members may be mechanically coupled to the deflectable member. Feedback or readout devices coupled to the structure provide signals indicative of deflection of the deflectable member under the influence of applied current and the magnetic field. Nulling current applied to the nulling members tends to oppose deflection of the deflectable member. The nulling current may be modulated to drive the feedback signal to a desired level and is used as a basis for calculating the current to be measured. The current may be measured directly upon calibration of feedback devices coupled to the deflectable member or to the nulling members. Arrays of sensors may be coupled to common busses for applying measured and nulling currents to sensors of the arrays and for detecting feedback signals.

Microelectro-mechanical high resolution current sensing apparatus

High resolution current sensing apparatus

The present invention relates to a micro electromechanical (MEM) isolator in which an input signal induces an output signal by means of electrically insulating mechanical motion. The MEM isolator device comprises a dielectric moveable platform suspended above a substrate by flexible beams. A drive and a control capacitor each have one electrode supported by the platform and one electrode supported by the substrate. Coupling between electrical and mechanical energies is achieved by providing an input signal to the drive capacitor to induce platform motion. When the input signal is fed to the drive capacitor, it actuates electrostatic motion of the platform resulting in a change in the value of the control capacitance. The change in the control capacitance is converted via a simple electronics circuit into an output that mirrors the input but is electrically isolated therefrom. The advantages of such a device include simple electrical isolation provided by the dielectric platform, built in signal-debounce inherent to the structure mechanics, and economical integration with silicon integrated circuits.

Micro electromechanical isolator

A method is provided for sensing and measuring an electrical current. The current to be measured is applied to a deflectable member in a sensing module in the presence of a magnetic field. Deflection of the member is detected as an indication of the current. A nulling current may be applied to one or more additional deflectable members mechanically linked to the deflectable member. Feedback or readout signals indicative of deflection of the members are monitored. The nulling current is modulated to drive the feedback signals to a desired level. The nulling current value is converted to a value representative of the current to be measured.

Method for sensing electrical current

Power amplifiers having reactive networks (such as classes C, C-E, E and F) employ tunable reactive devices in their reactive networks, with the reactive devices respective reactance values capable of being adjusted by means of respective control signals. The tunable reactive devices are made from micro-electromechanical (MEM) devices capable of being integrated with the control circuitry needed to produce the control signals and other amplifier components on a common substrate. The reactive components have high Q values across their adjustment range, enabling the amplifier to produce an output with a low harmonic content over a wide range of input signal frequencies, and a frequency agile, high quality output. The invention can be realized on a number of foundry technologies.

Integrated tunable high efficiency power amplifier

A high-Q precision integrated reversibly trimmable singleband oscillator and tunable multiband oscillator are presented that overcome the problems laser trimming and solid state switches. This is accomplished using micro-electromechanical system (MEMS) technology to integrate an amplifier and its tunable LC network on a common substrate. The LC network can be configured to provide a very narrow bandwidth frequency response which peaks at one or more very specific predetermined frequencies without de-Qing the oscillator.

Trimmable singleband and tunable multiband integrated oscillator using micro-electromechanical system (MEMS) technology

The present invention relates to a fabrication process relating to a fabrication process for manufacture of micro-electromechanical (MEM) devices such as cantilever supported beams. This fabrication process requires only two lithographic masking steps and offers moveable electromechanical devices with high electrical isolation. A preferred embodiment of the process uses electrically insulating glass substrate as the carrier substrate and single crystal silicon as the MEM component material. The process further includes deposition of an optional layer of insulating material such as silicon dioxide on top of a layer of doped silicon grown on a silicon substrate. The silicon dioxide is epoxy bonded to the glass substrate to create a silicon--silicon dioxide-epoxy-glass structure. The silicon is patterned using anisotropic plasma dry etching techniques. A second patterning then follows to pattern the silicon dioxide layer and an oxygen plasma etch is performed to undercut the epoxy film and to release the silicon MEM component. This two-mask process provides single crystal silicon MEMs with electrically isolated MEM component. Retaining silicon dioxide insulating material in selected areas mechanically supports the MEM component.

Process for manufacture of micro electromechanical devices having high

Growing community of inventors

Thousand Oaks, CA, United States of America

Jun Jason Yao