Lg Chem, Ltd

Jun Hyoung Park

Ji Hye Kim

Kwang Su Seo

Kyung Jun Yoon

Ki Seung Seo

Jang Soon Kim

Sang Hwan Kim

Jihye Jung

Mi Seon Kim

Jun Beom Park

A coating composition is provided. The coating composition of the present application has excellent compatibility between the components. In addition, there is an advantage that the release layer formed from the coating composition of the present application has low transmittance for light having a wavelength of 380 nm or more.

Coating composition

The present disclosure relates to a silicone-based coating composition, and a silicone-based release film including the same, wherein the silicone-based coating composition comprises a silicone-based compound represented by the following Chemical Formula 1 having a weight average molecular weight of greater than or equal to 25,000 g/mol and less than or equal to 70,000 g/mol:

Silicone-based coating composition and silicone-based release film comprising same

A substrate-free adhesive tape that is excellent in adhesive physical properties and is suitable for a continuous process is provided. The substrate-free adhesive tape includes a release film, and an adhesive layer provided on one surface of the release film and the adhesive layer containing a cured product of an adhesive composition, wherein when the release film is fixed on the outer surface of a semicircular tip part of a jig, the semicircular tip part having a radius of 22.5 mm, a breaking distance of the adhesive layer is 110 mm or less when the adhesive layer is stretched at a rate of 20 m/min from a semicircular center of the semicircular tip part toward an outermost direction of the semicircular tip part.

Substrate-free adhesive tape

Provided is a substrate-free transfer tape including: a release liner including a heavy peel surface and a light peel surface; and a transfer film layer provided on the heavy peel surface, in which release peel force between the heavy peel surface and the transfer film layer is from 10 g/in to 70 g/in or less at the time of peeling the transfer film layer at a rate of 3 m/min.

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Daejeon, South Korea

Jun Hyoung Park