Korea Institute of Machinery & Materials

Admbioscience Inc.

Center for Advanced Meta-materials

Jun-ho Jeong

Eung-Sug Lee

Dae-Guen Choi

Ji Hye Lee

Joo Yun Jung

Young-Suk Sim

Junhyuk Choi

Kyung-Hyun Whang

Dae-Geun Choi

So Hee Jeon

Ki-Don Kim

Jun-Hyuk Choi

Young-Jae Shin

HyonKee Sohn

So-Hee Jeon

Ji-Hye Lee

Jang-Joo Kim

Yun Woo Lee

Jong-Youp Shim

Jae-R Youn

Soon-Hyoung Hwang

Jeong Hwan Kim

Won Seok Chang

Sunghwan Chang

Seung Min Hyun

Hyung Cheoul Shim

Seong-Je Park

Sang Keun Sung

Hyeong-Ho Park

Sa-Rah Kim

Cheol-Hyeon Kim

Joo-Yun Jung

Hyeokjung Kang

Sohee Jeon

Yongrok Jeong

Hyuk Jun Kang

A nucleic acid film fabrication method, includes: a mixing step in which a nucleic acid is added in powder form to distilled water or deionized water to prepare a mixed solution; a stirring step in which the mixed solution is stirred; a mixed solution application step in which the mixed solution is applied to a mold corresponding in shape to a final product of a nucleic acid film; and a drying step in which the mixed solution applied to the mold is dried to be formed into the nucleic acid film, wherein the mold has a groove formed thereon in a thickness direction thereof, such that the nucleic acid film passing through the drying step has a protrusion protruding from one surface thereof toward human skin to correspond to the groove.

Method for manufacturing nucleic acid film and apparatus for injecting medicine using nucleic acid film

A transparent conductor according to an exemplary embodiment of the present invention includes a transparent substrate, and a transparent conductive pattern formed on the transparent substrate, and the transparent conductor includes a nanostructure on an upper surface of at least one of the transparent substrate and the transparent conductive pattern.

Transparent conductor including nanostructure and manufacturing method thereof

In a wave focusing device and a wave emitting device having the wave focusing device, the wave focusing device has a plurality of filters and focuses a wave by a phase overlap. The plurality of filters includes a first filter formed on a substrate, a second filter formed on the substrate and overlapping with the first filter in a first area, and a third filter formed on the substrate and overlapping with the second filter in a second area. A size of the first area is substantially same as that of the second area. A first portion of the second filter in the first area is inverted to a second portion of the second filter in the second area, with respect to a first axis. A wave passing through the wave focusing device is focused at a center of each of the first, second and third filters.

Ultrasonic lens andultrasonic wave emitting device having the same

A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.

Method for manufacturing three-dimensional structure using nanoimprint method

An exemplary embodiment of the present invention provides a manufacturing method of an electrode structure for an energy storage device, the method including: forming a polymer substrate configured to have a first uneven pattern on a first surface; forming an electrode active material layer on the first uneven pattern in a state that an tensile force is applied to the polymer substrate; and forming a second uneven pattern on the polymer substrate and the electrode active material layer by removing the tensile force.

Method for manufacturing electrode structure for flexible energy storage device, electrode structure manufactured thereby, and energy storage device including same

In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.

Method for fabricating an embedded pattern using a transfer-based imprinting

An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.

Organic light emitting device and manufacturing method thereof

A method of manufacturing a wire grid polarizer includes: preparing a stamp having a nanostructure body at one surface and forming a mask layer with anisotropic vapor deposition at the one surface; forming a metal film on a substrate; transferring a mask layer of an upper portion of a nanostructure body in the mask layer onto the metal film; and patterning the metal film into metal lines by removing a portion that is not covered with the mask layer in the metal film with dry etching.

Method of manufacturing wire grid polarizer

A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.

UV nanoimprint lithography process and apparatus

A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.

Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode

The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp. The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.

Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same

A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM). The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.

Microcontact printing method using imprinted nanostructure and nanostructure thereof

Growing community of inventors

Daejeon, South Korea

Jun-ho Jeong