Boe Technology Group Co., Ltd.

Hefei Xinsheng Optoelectronics Technology Co., Ltd.

International Business Machines Corporation

China Petroleum & Chemical Corporation

Beijing Research Institute of Chemical Industry, China Petroleum & Chemical Corporation

Beijing Boe Technology Development Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Huawei Technologies Co., Limited

Lenovo (beijing) Limited

Beijing Baidu Netcom Science Technology Co., Ltd

Audi Ag

Peking University

Research Institute of Petroleum Processing, Sinopec

Beijing University of Chemical Tehcnology

Wuhan Boe Optoelectronics Technology Co., Ltd.

Jun Feng Liu

Bin Zhou

Wei Li

Liangchen Yan

Tongshang Su

Dongfang Wang

Yang Zhang

Qinghe Wang

Ce Zhao

Yingbin Hu

Ning Liu

Wei Song

Yongchao Huang

Leilei Cheng

Luke Ding

Yuankui Ding

Jin Xin Ying

Ming Wang

Guangyao Li

Guangcai Yuan

Shuo Li

Ming Jin Chen

Jun Cheng

Mingfang Zheng

Tonglin Li

Haitao Wang

Jingang Fang

Kai Li

Hongfei Wu

Yunlong Zhang

Biao Luo

Xu Jia

Xuehai Gui

Dengfeng Shi

Yue Li

Xin Yang

Ming Hsi Wang

Tao Sun

Ke Xu

Zhao Li

Jie Yang

Yang Liang

Xu Liang Li

Jian Long Yang

Feng Pan

Kun Liu

Jiangliang Guo

Chao Han

Yun Ting Wang

Liusong Ni

Guang Ming Zhang

Jingjing Xia

Jilong Wang

Shengping Du

Shiming Yin

Zhi Zhu

Pei Pei Liang

Xiaoqing Wang

Mingfa Zhu

Haiying Zhang

Xu Shi

Shuangshuang Qiao

Xiangyue Lin

Dongqing Li

Weizhen Li

Huaijie Wang

Lei Wang

Lei Zhang

Peng Hui Jiang

Wei Chen

Yu Chen Zhou

Junren Chang

Yanping Liao

Kai Xu

Chao Wang

Wei Lin

Binbin Cao

Huiping Tian

Yongping Zhang

Rong Liu

Yujie Gao

Haifeng Wang

Ning Zhu

Xiaodong Zhang

Xiaojun Wang

Wuxia Fu

Liqun Zhang

Ye Song

Xiaohui Wu

Wenhui Xie

Fengli Wang

Dong Dong

Yu Wei

Zhiwen Luo

Youchang Xie

Bingyong Han

Ge Yang

Jifeng Shao

Zhilong Xu

Zhenghai Gao

A method for manufacturing a display panel includes: sequentially forming a conductive pattern, a light-emitting layer and a cathode layer on a substrate. The conductive pattern is formed by a one-time patterning process, and includes an auxiliary electrode layer. In a direction parallel to the substrate, both the first protective electrode and the second protective electrode in the auxiliary electrode layer extend over the metal electrode, a second orthographic projection of the second protective electrode on the substrate is within a first orthographic projection of the first protective electrode on the substrate, and an outer boundary of the second orthographic projection is staggered from an outer boundary of the first orthographic projection. The cathode layer is in contact with the first protective electrode and a sidewall of the metal electrode.

Display panel, method for manufacturing same, and display apparatus

A halogen-containing compound represented by a formula I and a use thereof as a ligand of an ethylene oligomerization catalyst composition, an ethylene oligomerization catalyst composition comprising the halogen-containing compound, and an ethylene oligomerization method, ethylene trimerization method and ethylene tetramerization method using the catalyst composition are provided. Serving as the ligand of the ethylene oligomerization catalyst, the halogen-containing polymer may effectively improve the catalytic performance of a catalyst system, especially by displaying a significantly improved catalytic performance in an ethylene oligomerization reaction. The maximum catalyst activity may exceed 4&#xd7;10g&#xb7;mol(Cr)&#xb7;h, and the total selectivity of 1-hexene and 1-octene exceeds 92 wt %. In a C6 product, the content of 1-hexene may reach about 97%, and in a C8 product, the content of 1-octene may reach more than 98%.

Halogen-containing compound and use thereof as catalyst ligand in ethylene oligomerization

An array substrate, a method for manufacturing the array substrate and a display device are provided. The array substrate includes: a base substrate, and a thin film transistor, a storage capacitor, and a lapping pattern for connecting the thin film transistor to the storage capacitor arranged on the base substrate; wherein the thin film transistor includes a semiconductor layer, a gate insulation layer, a gate electrode, an interlayer insulation layer, a source electrode and a drain electrode arranged sequentially in that order; the interlayer insulation layer includes at least two inorganic insulation layers and at least one organic insulation layer laminated one on another, and both a layer proximate to the base substrate and a layer distal to the base substrate in the interlayer insulation layer are the inorganic insulation layers.

Array substrate comprising an interlay insulation layer including at least two inorganic insulation layers and at least one organic insulation layer laminated one on another

A method for manufacturing a light-emitting component, including forming an auxiliary electrode and a first electrode arranged at an interval on a base substrate; depositing, by means of a mask with a hollow area, a light-emitting layer on the base substrate on which the auxiliary electrode and the first electrode are formed; and forming a second electrode on the base substrate on which the light-emitting layer is formed. The light-emitting layer covers at least part of the first electrode, and at least a partial area of the auxiliary electrode is exposed outside the light-emitting layer. The second electrode covers at least part of the light-emitting layer and the at least partial area of the auxiliary electrode, and the second electrode is connected to the at least partial area of the auxiliary electrode.

Light-emitting component, manufacturing method therefor, mask, and display device

The present disclosure provides a display substrate, a method for manufacturing the display substrate, and a display device. The display substrate includes a first conductive line extending in a first direction on a base substrate, a second conductive line extending in a second direction crossing the first direction on the base substrate, and an insulation layer arranged between the first conductive line and the second conductive line. The display substrate further includes a buffer layer arranged between the first conductive line and the base substrate, a groove extending in the first direction is formed in the buffer layer, the first conductive line is arranged in the groove, and a surface of the first conductive line away from the base substrate is flush with a surface of the buffer layer away from the base substrate.

Display substrate, method for manufacturing the same and display device

The present application discloses a display substrate. The display substrate may include a base substrate; a plurality of first electrodes arranged in an array on the base substrate; and a pixel defining layer defining a plurality of openings on the base substrate. The plurality of openings may overlap the plurality of first electrodes respectively. The pixel defining layer may include a plurality of first pixel defining units and a plurality of second pixel defining units; and the plurality of first pixel defining units may be separated from one another.

Display substrate, method for manufacturing display substrate, and display apparatus

A display substrate, a method for forming the display substrate and a display device are provided. The display substrate includes: a first conductive pattern located on a base substrate, where a ring-shaped conductive protection structure is arranged at an edge of a preset region of the first conductive pattern and surrounds the preset region, and the conductive protection structure is made of an anti-dry-etching material; an insulation layer covering the first conductive pattern; and a second conductive pattern located on a side of the insulation layer away from the first conductive pattern, where the second conductive pattern is electrically connected to the first conductive pattern through the via-hole.

Display substrate and method for forming the same and display device

The present disclosure relates to the display technology, and provides an OLED display substrate, a method for manufacturing the OLED display substrate and a display device. The method includes: forming pixel definition layer transition patterns with metal; and oxidizing the pixel definition layer transition patterns to form an insulative pixel definition layer.

Method for manufacturing organic light-emitting diode display substrate

Disclosed in the disclosure are a display panel and a display device. The display panel includes: a first base substrate; a plurality of scan signal lines arranged on a side of the first base substrate; a plurality of data signal lines arranged on sides, facing away from the first base substrate, of the scan signal lines; and first shielding parts arranged on sides, facing away from the scan signal lines, of the data signal lines, wherein each first shielding part is of a strip structure, and in each sub-pixel unit, both sides of the data signal line are each provided with one first shielding part.

Display panel and display device

Disclosed are a photoresist composition, a pixel definition structure and a manufacturing method thereof, and a display panel. The photoresist composition includes an organic film-forming resin, a superhydrophobic polymerizable monomer, a polyfunctional crosslinkable polymerizable monomer, a photoinitiator, an additive and a solvent.

Photoresist composition, pixel definition structure and manufacturing method thereof, and display panel

An array substrate is provided, including a base substrate, a semiconductor active layer, a gate electrode, a source electrode, and a drain electrode that are sequentially provided, and further including a first insulating layer, a second insulating layer, a third insulating layer, at least one first via, and at least one second via. Each first via penetrates through the third insulating layer, and in each pixel unit with plural chromatic color resists, each first via is between adjacent two chromatic color resists and filled by one of the adjacent two chromatic color resists. Each second via penetrates through the second insulating layer, the at least one second via is in one-to-one correspondence with the at least one first via, each second via is filled by a chromatic color resist having a same color as that of the chromatic color resist in the corresponding first via.

Array substrate, manufacturing method thereof, display panel and display device

A method of manufacturing an array substrate is provided, which comprises: forming a first metal layer and an insulating layer in sequence on a base substrate, the insulating layer covering the first metal layer; forming an etch barrier layer on the insulating layer; etching the etching barrier layer and the insulating layer multiple times, wherein an effective blocking area of the etching barrier layer decreases successively in each etching to form a connection hole penetrating the insulating layer, the connection hole includes a plurality of via holes connected in sequence, and a slope angle of a hole wall of each via hole is smaller than a preset slope angle; and forming a second metal layer, the second metal layer being connected to the first metal layer through the connection hole.

Method of manufacturing array substrate, and array substrate

Disclosed are an array substrate, a method for fabricating the same, a display panel, and a display device, and the array substrate includes: an underlying substrate, and gate lines and data lines located on the underlying substrate, and intersecting with each other, a layer where the gate lines are located is between a layer where the data lines are located, and the underlying substrate; and the array substrate further includes a buffer layer located between the underlying substrate and the layer where the gate lines are located; and the buffer layer includes a plurality of through-holes, where orthographical projections of the through-holes onto the underlying substrate cover orthographical projections of the areas where the gate lines intersect with the data lines, onto the underlying substrate.

Array substrate, method for fabricating the same display panel, and display device

The present disclosure provides a display substrate, a method for preparing the same, and a display device including the display substrate. The method includes: forming a conductive layer; forming a first photoresist pattern and a second photoresist pattern on the conductive layer, in which the adhesion between the first photoresist pattern and the conductive layer is less than the adhesion between the second photoresist pattern and the conductive layer; and etching the conductive layer by using the first photoresist pattern and the second photoresist pattern as masks to form a first conductive pattern and a second conductive pattern, respectively, in which a line width difference between the first conductive pattern and the first photoresist pattern is greater than a line width difference between the second conductive pattern and the second photoresist pattern.

Display substrate, method for preparing the same, and display device

An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes: a base substrate; a first signal line on the base substrate; a first buffer layer provided on the base substrate and covering the first signal line; a second signal line on a side of the first buffer layer facing away from the base substrate; a first insulating layer provided on the base substrate and covering the second signal line; and a thin film transistor on a side of the first insulating layer facing away from the base substrate, the thin film transistor including a gate electrode, a source electrode and a drain electrode. A thickness of the first signal line is greater than that of the gate electrode, and a thickness of the second signal line is greater than that of the source electrode or the drain electrode.

Array substrate, manufacturing method thereof, and display device

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Beijing, China

Jun Feng Liu