Pharmacyclics, Inc.

Asml Netherlands B.v.

Verisilicon Holdings Company Ltd.

Verisilicon Microelectronics (shanghai) Co., Ltd.

Jun Chen

Joseph J Buggy

Laurence Elias

Thomas Ingolf Wallow

Lefan Zhong

Bart Laenens

Song Li

Yi-Hsing Peng

Isaac Wang

A method for calibrating a process model of a patterning process. The method includes identifying a portion of the substrate that has values within a tolerance band of one or more parameters (e.g., CD, EPE, etc.) of the patterning process, obtaining, via a metrology tool, metrology data corresponding to the portion of the substrate, processing the metrology data, and calibrating a process model based on the processed metrology data.

Model calibration and guided metrology based on smart sampling

A display controller, comprising a 3D_LUT random access memory, which stores at least a 3D Lookup table; and a display control processing unit, comprising: a computing unit, a register, a color signal booster, and a color signal attenuator; wherein after input color signals are received by the color signal booster, and the color signal booster amplifies color signals by a first predetermined factor, wherein the computing unit calculates the address of the 3D Lookup table, and loads the 3D Lookup table from the 3D_LUT random access memory according to the register, wherein the color signal attenuator attenuates color signals by a second predetermined factor. The present disclosure significantly increases the precision of color conversion from one RGB color space to another RGB color space, and does not increase the RAM cost, since the cost of multiplying or dividing by power of 2, for example, is limited.

Display controller, display control method, and display control system for color space conversion

A method including obtaining a plurality of gauges of a plurality of gauge patterns for a patterning process, each gauge pattern configured for measurement of a parameter of the patterning process when created as part of the patterning process, and creating a selection of one or more gauges from the plurality of gauges, wherein a gauge is included in the selection provided the gauge and all the other gauges, if any, of the same gauge pattern, or all of the one or more gauges of the same gauge pattern linked to the gauge, pass a gauge printability check.

Gauge pattern selection

Described herein are methods and compositions for treating HER2-amplified cancer. The methods include administering to an individual in need thereof ibrutinib.

Methods for the treatment of HER2 amplified cancer

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San Jose, CA, United States of America

Jun Chen