Asm IP Holding B.v.

Julll Lee

JaeMin Roh

Dong Rak Jung

ChangMin Lee

DaeYoun Kim

Sung Hoon Jun

Seung Wook Kim

GunYong Park

A substrate support assembly arranged in a chamber includes: a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the first surface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.

Substrate support assembly and substrate processing device including the same

A substrate processing apparatus capable of improving thin film uniformity on a substrate by controlling the position of a substrate supporting apparatus includes a plurality of reactors, wherein each of the reactors includes a substrate supporting apparatus; a ring surrounding the substrate supporting apparatus; and an alignment device for moving the substrate supporting apparatus, wherein the ring is installed such that one surface of the ring comes in contact with the substrate supporting apparatus as the substrate supporting apparatus moves and the ring is movable by a pushing force of the substrate supporting apparatus.

Substrate processing apparatus and substrate processing method

Exhaust flow control ring for semiconductor deposition apparatus

Growing community of inventors

Cheonan-si, South Korea

Julll Lee