Saint-gobain Glass France

Cardinal Ig Company

Juliette Sternchuss

Philippe Letocart

Jingwei Zhang

Jan Hagen

Matthias Alschinger

A material includes a substrate with a thin-film multilayer coated on at least one surface of the substrate, the thin-film multilayer including at least two films based on a transparent electrically conductive oxide. The at least two films are separated by at least one dielectric intermediate film having a physical thickness of at most 50 nm. No metal films is deposited between the at least two films based on a transparent electrically conductive oxide. The thin-film multilayer further includes at least one oxygen barrier film located above the film located furthest from the substrate of the at least two films based on a transparent electrically conductive oxide. Each film of the at least two films based on a transparent electrically conductive oxide has a physical thickness in a range of from 20 to 80 nm.

Substrate coated with a low-E multilayer

An electrically conductive support for a glazing unit having liquid crystal scattering properties may include a multilayer of thin films. In one example, the thin films include an electrode comprising a TCO film, a silicon-nitride-based first barrier film having a thickness eof at least 5 nm, and a silicon-oxide-based second barrier film having a thickness eof at least 30 nm. The thickness emay be smaller than or equal to eand/or smaller than 80 nm. Further, the cumulative thickness of the first and second barrier films may be larger than or equal to 50 nm and smaller than 150 nm.

Growing community of inventors

Saint Germain-en-Laye, France

Juliette Sternchuss