Other

International Business Machines Corporation

The B. F. Goodrich Company

Sumitomo Bakelite Company Limited

Juliann Opitz

Robert David Allen

Thomas Ingolf Wallow

Saikumar Jayaraman

Richard Vicari

Larry Funderburk Rhodes

Ratnam Sooriyakumaran

Brian L Goodall

Hiroshi Ito

Richard Anthony DiPietro

Robert A Shick

Pushkara Rao Varanasi

Gregory Breyta

Donald Clifford Hofer

John-Henry Lipian

Thomas Wallow

Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin monomer containing the pendant anhydride functionality can be copolymerized with other polycycloolefin monomers that contain pendant functional groups to yield random copolymer products.

Polycyclic polymers containing pendant cyclic anhydride groups

Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.

Polycyclic resist compositions with increased etch resistance

The invention is directed to polymers containing a repeating unit derived from a norbornene sulfonamide. These may be addition polymers which include copolymers with one or more comonomers such as norbornene, ethylene, an acrylate or sulfur dioxide or carbon monoxide. Said monomers may be polymerized using single or multicomponent Group VIII catalysts. The norbornene sulfonamides can also form ROMP polymers using known metathesis catalysts. Preferably the ROMP polymers may be hydrogenated to give more stable polymers.

Norbornene sulfonamide polymers

The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.

Resist composition with radiation sensitive acid generator

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San Jose, CA, United States of America

Juliann Opitz