Evonik Operations Gmbh

Evonik Degussa Gmbh

Julian Teichmann

Hans-Wolfram Lerner

Matthias Wagner

Patrik Stenner

Axel Ronneburg

Timo Stahl

Silvia Blank-shim

Verena Breuers

Jonas Hönig

Valeri Leich

Stefan Schumann

A process can be used for the functionalization of graphene material by mixing graphene material with at least one silane. The functionalized graphene material is useful, for example, in thermoplastics.

Functionalized graphene, method for producing a functionalized graphene, and its use

A process can be used for the preparation of tris(trichlorosilyl)dichlorogallylgermane, which is a chlorinated, uncharged substance.

Tris(trichlorosily1)dichlorogallylgermane, process for the preparation thereof and use thereof

A novel process provides for the preparation of the chlorinated, uncharged substance tetrakis(trichlorosilyl)germane, and for the use thereof.

Tetrakis(trichlorosilyl)germane, process for the preparation thereof and use thereof

A trichlorogermanide of formula (I): [RN]/[RP]Cl[GeCl] (I), where R is Me, Et, iPr, nBu, or Ph, tris(trichlorosilyl)germanide of formula (II): [RN]/[RP][Ge(SiCl)] (II), where R is Me, Et, iPr, nBu, or Ph, a tris(trichlorosilyl)germanide adduct of GaClof formula (III): [PhP][Ge(SiCl)*GaCl], and a tris(trichlorosilyl)germanide adduct of BBrof formula (IV): [PhP][Ge(SiCl)*BBr]. Also, methods for preparing the trichlorogermanides of formula (I), the tris(trichlorosilyl)germanide of formula (II), the tris(trichlorosilyl)germanide adduct of BBrof formula (IV).

Halogermanides and methods for the preparation thereof

A trichlorogermanide of formula (I): [RN]/[RP]Cl[GeCl] (I), where R is Me, Et, iPr, nBu, or Ph, tris(trichlorosilyl)germanide of formula (II): [RN]/[RP][Ge(SiCl)] (II), where R is Me, Et, iPr, nBu, or Ph, a tris(trichlorosilyl)germanide adduct of GaClof formula (III): [Php][Ge(SiCl)*GaCl], and a tris(trichlorosilyl)germanide adduct of BBrof formula (IV): [PhP[]Ge(SiCl)*BBr]. Also, methods for preparing the trichlorogermanides of formula (I), the tris(trichlorosilyl)germanide of formula (II), the tris(trichlorosilyl)germanide adduct of BBrof formula (IV).

Triphenylgermylsilane (PhGe&#x2014;SiH) is useful for the production of germanium-silicon layers (Ge&#x2014;Si) or as transfer agent of silane groups (SiH). Further, a method describes the production of triphenylgermylsilane (PhGe&#x2014;SiH) by reducing trichlorosilyl-triphenylgermane (PhGe&#x2014;SiCl) with a hydride in solution, and another method describes the production of trichlorosilytrichlorogermane (ClGe&#x2014;SiCl) by reacting trichlorosilyltriphenyigermane (PhGe&#x2014;SiCl) with hydrogen chloride (HCl) in the presence of AlClin solution. In addition, trichlorosilyltrichlorogermane is also used for the production of germanium-silicon layers (Ge&#x2014;Si).

Triphenylgermylsilane and trichlorosilyl-trichlorogermane for the production of germanium-silicon layers, and method for the production thereof from trichlorosilyl-triphenylgermane

A novel compound chlorosilylarylgermane, a method for preparing the compound, and the use of the compound are described. A method for preparing trichlorosilyltrichlorogermane and the use of trichlorosilyltrichlorogermane are also described.

Growing community of inventors

Frankfurt am Main, Germany

Julian Teichmann