Nikon Corporation

The University of Arizona

National University of Ireland, Galway

Julia A Sakamoto

Donis George Flagello

Harrison H Barrett

Alexander Goncharov

Shane Roy Palmer

Phase conflicts in pattern transfer with phase masks can be resolve by exposing pattern features with a first pattern and a second pattern, wherein the second pattern is selected based on the phase conflicts. In scanned exposures using pulsed lasers, a number of exposures of the second pattern can be less than 20% of a total number of exposures.

Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scanner

An imaging apparatus for simultaneously determining optical parameters of the eye comprising: a light source for illuminating at least a portion of the eye pupil; an illumination optical system for directing light rays emitted from the light source into the eye; a light receiving optical system for guiding the light rays reflected from the eye to a detector unit, wherein the detector unit detects an image intensity distribution from the light rays reflected from the eye; and an arithmetic unit for determining optical characteristics of the eye by parameter estimation is provided.

Inverse optical design

Growing community of inventors

Tucson, AZ, United States of America

Julia A Sakamoto