Average Co-Inventor Count = 3.11
ph-index = 9
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Hitachi, Ltd. (9 from 42,496 patents)
2. L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des (3 from 715 patents)
3. Hitachi Chemical Company, Ltd. (2 from 1,641 patents)
4. Other (1 from 832,843 patents)
5. Kanto Kagaku Kabushiki Kaisha (1 from 101 patents)
6. L'air Liquide, Societe Anonyme L'etude Et L'exploitation Des Procedes (1 from 1 patent)
16 patents:
1. 8211571 - Artificial graphite particles and method for manufacturing same, nonaqueous electrolyte secondary cell negative electrode and method for manufacturing same, and lithium secondary cell
2. 7829222 - Artificial graphite particles and method for manufacturing same, nonaqueous electrolyte secondary cell, negative electrode and method for manufacturing same, and lithium secondary cell
3. 7074523 - Lithium secondary battery
4. 7022878 - Organic borate compounds and the nonaqueous electrolytes and lithium secondary batteries using the compounds
5. 6824928 - Organic borate compounds and the nonaqueous electrolytes and lithium secondary batteries using the compounds
6. 6696202 - Electrical appliance using lithium secondary batteries
7. 6495293 - Non-aqueous electrolyte comprising a fluorinated solvent
8. 6475680 - Lithium secondary battery, its electrolyte, and electric apparatus using the same
9. 6210835 - Lithium secondary battery and liquid electrolyte for the battery
10. 6176094 - Refrigerating machine oil composition, and refrigeration and compressor using the refrigerating machine oil composition
11. 5985403 - Magnetic recording medium and magnetic recording reproducer
12. 5456980 - Ammonium carboxylate lubricant and magnetic recording medium using the
13. 5254369 - Method of forming a silicon diffusion and/or overlay coating on the
14. 5230847 - Method of forming refractory metal free standing shapes
15. 5091209 - Method of forming a thin copper film by low temperture CVD