Unimicron Technology Corporation

Jui-Jung Chien

Cheng-Ta Ko

Yu-Hua Chen

Pu-Ju Lin

Shih-Lian Cheng

Wei-Tse Ho

A mask structure and a manufacturing method of the mask structure are provided. The mask structure includes a transparent substrate, a patterned metal layer, and a plurality of microlens structures. The patterned metal layer is disposed on the transparent substrate and exposing a portion of the transparent substrate. The microlens structures are disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.

Mask structure and manufacturing method thereof

A manufacturing method of a circuit substrate is provided. A substrate is provided. A positive photoresist layer is coated on the substrate. Once exposure process is performed on the positive photoresist layer disposed on the substrate so as to simultaneously form concaves with at least two different depths.

Growing community of inventors

Hsinchu County, Taiwan

Jui-Jung Chien