Advanced Semiconductor Engineering, Inc.

Jui-I Yu

Tsung-Hua Wu

Shih-Kuang Chen

Shyh-Ing Wu

Li-Cheng Tai

Chueh-An Hsieh

Jiunn Chen

Tsung-Chieh Ho

An under bump metallurgy structure and wafer structure using the same and method of manufacturing wafer structure are provided. The under bump metallurgy structure includes an adhesion layer, a barrier layer and a wetting layer. The adhesion layer is disposed on a bonding pad of a wafer. The barrier layer is disposed on the adhesion layer. The wetting layer is disposed on the barrier layer. The adhesion layer, the barrier layer and the wetting layer are respectively made of nickel with boron, cobalt and gold.

Under bump metallurgy structure and wafer structure using the same and method of manufacturing wafer structure

A wafer structure including a semiconductor substrate, a number of UBM layers and a number of bumps is provided. The semiconductor substrate has an active surface, a number of bonding pads and a passivation layer. The bonding pads are positioned on the active surface of the semiconductor substrate. The passivation layer covers the active surface of the semiconductor substrate and exposes the bonding pads. The UBM layers are respectively arranged on the bonding pads, and each UBM layer includes an adhesive layer, a super-lattice barrier layer and a wetting layer. The adhesion layer is disposed on bonding pads. The super-lattice barrier layer is disposed on the adhesion layer and includes a number of alternately stacked sub-barrier layers and sub-wetting layers. The wetting layer is disposed on the super-lattice barrier layer, and the bump is disposed on the wetting layer.

Wafer structure with a multi-layer barrier in an UBM layer network device with power supply

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Kaohsiung, Taiwan

Jui-I Yu