Silecs Oy

Inkron Oy

Koite Health Oy

Pibond Oy

Greenlux Finland Oy

Silecs, Inc.

Juha T Rantala

Jyri Paulasaari

Janne Kylmä

Jarkko Heikkinen

Jason S Reid

Arto L T Maaninen

T Teemu T Tormanen

Nungavram S Viswanathan

Tiina Maaninen

Jarkko J Pietikainen

William McLaughlin

Wei-Min Li

David Thomas

Thomas Gädda

Sakari Nikinmaa

Jarkko Pietikäinen

Tommi Pätilä

TTeemu T Tormanen

Nigel Hackera

Admir Hadzic

Nigel Hacker

Turo T Törmänen

Nina Pirilä

Graeme Gordon

Mikael Broman

David A Thomas

Nungavaram Sundaram Viswanathan

Teemu Tormanen

Method of treating biological surfaces with electromagnetic radiation in the form of light of two different energy levels, a first light with photons having a majority energy in the range from 3.5 eV to 2.8 eV and a second light with photons having a majority energy in the range from 1.24 eV to 2.48 eV. The photons of the first light and the second light are simultaneously directed against the biological surface. The invention also contemplates the use of sensitizers in topical treatments of infections using the method. The treatment will achieve good tissue penetration. It makes it possible to give antibacterial treatment to different areas of pathogen at the same time as two or more different energy photons can target molecules in different areas.

Method of treatment of biological surfaces

Antibiotic for use in a method comprising systemically administering a photosensitive antibiotic to a subject having a microbial infection in a target tissue to provide a blood plasma concentration of the antibiotic in the subject; allowing the plasma or tissue concentration of the antibiotic increase to a predetermined level; and subjecting the target tissue to photodynamic therapy in order to increase the antimicrobial action of the antibiotic in the target tissue. With light activation the efficacy of the photosensitizer antibiotic can be enhanced, the spectrum of the microbial effect broadened and even an antiviral effect can be obtained. Generally, the present invention can be exploited when there is a need for enhancement of the local antimicrobial effect of antibiotics.

Method of enhancing the antimicrobial action of systemically administered antibiotics

A composition for a low refractive film, said composition comprising 10 parts by weight of a polysiloxane and 3 to 150 parts by weight of a volatile hydroxyalkylsilane. Based on the polysiloxane composition, films can be produced having a porous polysiloxane network and exhibiting a low refractive index of 1.4 or less and dielectric constant of 1.5 or less.

Polysiloxane compositions and uses thereof

An optical coating has a siloxane polymer and noble metal particles. The coating has an index of refraction that is different for in-plane and out-of-plane. The coating has reverse optical dispersion within the visible wavelength range, and preferably a maximum absorption peak between 400-1000 nm wavelength range is greater than 700 nm. In one example the metal particles are noble metal nanorods having an average particle width of less than 400 nm.

Dielectric siloxane particle films and devices having the same

A display has a plurality of pixels in a matrix, the pixels each comprising a liquid crystal layer and/or light emitting diode layer, a plurality of substrates, at least a first substrate being optically transmissive to visible light, an electrode formed on one of the substrates and having electrically conductive material that has an electrical resistivity of less than 200 &#x3a9;/sq and that comprises a siloxane material and particles having an average particle size of less than 10 microns.

Electrically conductive siloxane particle films, and devices with the same

An adhesive or encapsulant composition, having a siloxane polymer having a molecular weight of from 300 to 150,000 g/mol and having a viscosity of from 1000 to 100,000 mPa-sec at 5 rpm viscometer and at 25&#xb0; C., and a curing agent that aids in curing the siloxane polymer upon the application of ultraviolet light. The composition is transmissive to visible light with an optical transmissivity of 95% or more in the visible spectrum at a thickness of 1 mm or less, and wherein the siloxane polymer is a material formed without hydrosilylation and has less than 5 mol % of Si&#x2014;OH groups compared to all groups bound to Si therein, and substantially no Si&#x2014;H bonds.

Transparent siloxane encapsulant and adhesive

A siloxane polymer is made by providing a first compound having the chemical formula SiRRwhere a is from 1 to 3, Ris a reactive group, and Ris an alkyl group or an aryl group, and providing a second compound having the chemical formula SiRRRwhere Ris a cross-linking functional group, Ris a reactive group, and Ris an alkyl or aryl group, and where b=1 to 2, and c=1 to (4&#x2212;b). The first and second compounds are polymerized together to form a siloxane polymer and a plurality of particles mixed with the siloxane polymer.

Method of making a siloxane polymer composition

Phenoxyphenylsilane monomers were synthesized and polymerized. The polymers have high refractive indices and excellent UV and thermal stability. Their water and oxygen permeability is lower than commercial phenyl silicone elastomers. They show good compatibility with metal oxide nanoparticles. The polymers of the invention are suitable as LED encapsulant, as light guide material in CMOS image sensors, in OLED devices, lasers and in other optical applications.

Siloxane monomers, their polymerization and uses thereof

An LED lamp is formed from a die substrate wherein the substrate has formed thereon a semiconductor material, an electrode for the application of a bias across the semiconductor material for causing light to be emitted therefrom, and an adhesive that bonds the die substrate to a support substrate, wherein the adhesive is a polymerized siloxane polymer having a thermal conductivity of greater than 0.1 watts per meter kelvin (W/(m&#xb7;K)) wherein the adhesive is not light absorbing, wherein the siloxane polymer has silicon and oxygen in the polymer backbone, as well as aryl or alky groups bound thereto, and wherein the adhesive further comprises particles having an average particle size of less than 100 microns.

LED lamp with siloxane particle material

Method of forming a protective hard mask layer on a substrate in a semiconductor etch process, comprising the step of applying by solution deposition on the substrate a solution or colloidal dispersion of an alumina polymer, said solution or dispersion being obtained by hydrolysis and condensation of monomers of at least one aluminium oxide precursor in a solvent or a solvent mixture in the presence of water and a catalyst. The invention can be used for making a hard mask in a TSV process to form a high aspect ratio via a structure on a semiconductor substrate.

Etch resistant alumina based coatings

A method for making a dielectric film includes a substrate on which is deposited a siloxane starting material and particles, wherein the siloxane starting material has a siloxane polymer, a siloxane oligomer and/or silane monomers, and wherein the particles have an average particle size of less than 400 nm. After deposition, heat and/or electromagnetic energy is applied to the siloxane particle layer so as to cure the layer and form a dielectric film on the substrate. The formed film is optically transmissive to visible light and transmits at least 80% of the visible light incident thereon, and is electrically insulating and has a sheet resistance of 1000 &#x3a9;/sq or more.

Dielectric siloxane particle films, and devices having the same

A siloxane polymer is made by providing a first compound having the chemical formula SiRRwhere a is from 1 to 3, Ris a reactive group, and Ris an alkyl group or an aryl group, and providing a second compound having the chemical formula SiRRRwhere Ris a cross-linking functional group, Ris a reactive group, and Ris an alkyl or aryl group, and where b=1 to 2, and c=1 to (4&#x2212;b). The first and second compounds are polymerized together to form a siloxane polymer. The siloxane polymer can be then used in a final composition where the siloxane polymer comprises from 5 to 100% by weight, and filler (e.g. microparticles, nanoparticles, nanowires, etc.) comprises from zero to 95% by weight. The siloxane polymer composition is useful in a variety of areas such as an adhesive, e.g. as a die attach adhesive in semiconductor (e.g. LED) packaging applications, encapsulants, optical coatings, protective coatings, and other applications.

High-RI siloxane monomers, their polymerization and use

Method of forming a protective hard mask layer on a substrate in a semiconductor etch process, comprising the step of applying by solution deposition on the substrate a solution or colloidal dispersion of an alumina polymer, said solution or dispersion being obtained by hydrolysis and condensation of monomers of at least one aluminum oxide precursor in a solvent or a solvent mixture in the presence of water and a catalyst. The invention can be used for making a hard mask in a TSV process to form a high aspect ratio via a structure on a semiconductor substrate.

Growing community of inventors

Helsinki, Finland

Juha T Rantala