Hoechst Aktiengesellschaft

Hoechst Celanese Corporation

Other

Morton International, Inc.

Ticona Gmbh

Juergen Lingnau

Ralph R Dammel

Karl-Friedrich Doessel

Richard Vicari

Mohammad Aslam

Georg Pawlowski

Kenneth G Davenport

Dieter Guenther

Wilson B Ray

Juergen Theis

Rainer Wingen

Horst Roeschert

Hans-Joachim Merrem

Engelbert Pliefke

Michael Hoffmockel

Werner Prass

Ude Scheunemann

Albert Bender

Rudolf Zertani

Hans-Dieter Frommeld

Klaus Horn

Michael Feldhues

Klaus-Peter Schoen

Karl-Friedrich Mück

Klaus Schmitt

Klaus Reuter

Matthias Göring

Guenther Kaempf

Norbert Hanold

Horst Weiler

Peter Riedel

Process for removing methanol from formaldehyde-containing solutions. The present invention relates to a process for removing methanol from formaldehyde-containing solutions, with methanol being converted into formaldehyde dimethyl acetal by reactive distillation in the presence of an acidic fixed-bed catalyst, and the resultant mixture comprising methanol, formaldehyde dimethyl acetal and possibly other impurities being distilled off.

Process for removing methanol from formaldehyde-containing solutions

A radiation-curable mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and contains an acid-curable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pK.sub.a value of less than about 12. A radiation-curable recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

Radiation-curable mixture, and radiation-sensitive recording material

A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of high-energy radiation and an acid-cleavable compound, wherein the compound which forms an acid contains aromatically bound chlorine or bromine and has a pK.sub.a value of less than about 12 or is a derivative of a compound having such a pK.sub.a value. The mixture and the recording material produced therefrom have a relatively high-sensitivity and improved resolution and, in addition, exhibit no scumming after development.

Positive radiation-sensitive mixture and recording material produced

An apparatus for reprocessing special waste of photocrosslinkable scrap material is composed of a housing equipped with a feed hopper, one or more UV emitters arranged in the housing to irradiate the scrap material, and a chopper arranged in the housing to comminute the scrap material by chopping. The apparatus is usefully employed in a method for reprocessing photocrosslinkable scrap material.

Apparatus for reprocessing special waste

A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:

Positive-working radiation-sensitive mixture and copying material

A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pK.sub.a value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

Radiation-curable composition and radiation-sensitive recording material

A photopolymerizable mixture is disclosed that contains a polymer binder, a polymerizable compound having at least one terminal ethylene double bond and a boiling point above 100.degree. C. at normal pressure, a hexaarylbisimidazole and a 1,3-diarylpyrazoline or a 1-aryl-3-aralkenyl-pyrazoline. The mixture is suitable for the preparation of printing plates and photoresists and is distinguished by high photosensitivity and low sensitivity towards acid solutions.

Photopolymerizable mixture and recording material prepared therefrom

A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pK.sub.a value of less than about 12 or is a derivative of a compound having such a pK.sub.a value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

Positive radiation-sensitive mixture, and radiation-sensitive recording

An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically conductive oligomer or polymer dissolved in a solvent to at least one polymer which is sensitive to ionizing radiation. The resist material is useful in preparing electron beam resists which prevent electrostatic charging and resultant electrostatic fields.

Electrically conductive resist material, a process for its preparation

3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Process for the production of 3,5-disubstituted-4-acetoxystyrene

The invention relates to 4-chlorooxazole derivatives of the general formula I ##STR1## which carry an unsaturated group in the 2- or 5-position, e.g., the --CH.dbd.CH-- or --CH.dbd.CH--CH.dbd.CH-- group. In the formula

4-chlorooxazole derivatives and processes for their preparation and use

A negative-working radiation-sensitive mixture comprising a binder and a polymer containing 1,2,3-thiadiazole groups is disclosed. The binder is a polyfunctional compound having functional groups that react with ketene. The polymer is a compound obtained by polymerization of a compound of the general formula I ##STR1## in which R is a polymerizable group. If the polymer is a copolymer containing comonomers having functional groups capable of reacting with ketene, the binder can be omitted. The negative-working radiation-sensitive mixture is particularly suitable for UV, electron beam and X-ray lithography.

Negative-working radiation-sensitive mixture with polymer having

Preparation of 3,5-disubstituted-4-acetoxystyrene

A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of actinic radiation, and an acid-cleavable compound, the acid-cleavable compound producing, as cleavage product, an aromatically-substituted alcohol of the general formula I. The radiation-sensitive mixture according to the invention

Growing community of inventors

Mainz-Laubenheim, Germany

Juergen Lingnau