Carl Zeiss Smt Gmbh

Juergen Hartmaier

Karl-Heinz Schuster

Damian Fiolka

Manfred Maul

Gundula Weiss

Dieter Schmerek

Frank Marianek

Detlev Mueller

Otto Hahnemann

The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.

Optical system of an illumination device of a projection exposure apparatus

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Oberkochen, Germany

Juergen Hartmaier