Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Asml Netherlands B.v.

Carl-zeiss-stiftung

Carl Zelss Smt Ag

Juergen Fischer

Thorsten Rassel

Hubert Holderer

Wolfgang Hummel

Ulrich Schoenhoff

Norbert Muehlberger

Ulrich Weber

Sascha Bleidistel

Armin Schoeppach

Alexander Kohl

Johannes Lippert

Jochen Weber

Michael Muehlbeyer

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Matthias Orth

Raoul Reiner

Markus Neumaier

Stefan Schoengart

Armin Werber

Baerbel Trossbach

Bernhard Gellrich

Andreas Wurmbrand

Paul Graeupner

Juergen Huber

Christiaan Alexander Hoogendam

Bob Streefkerk

Hans Butler

Johannes Jacobus Matheus Baselmans

Wilhelm Ulrich

Markus Deguenther

Aurelian Dodoc

Bernhard Geuppert

Hans-Juergen Rostalski

Susanne Beder

Ulrich Loering

Bauke Jansen

Florian Bach

Johannes Rau

Robertus Johannes Marinus De Jongh

Karl Heinz Schuster

Baerbel Schwaer

Almut Czap

Stephan Back

Joerg Mallmann

Albrecht Ranck

Thomas Rohe

Reiner Raoul

The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (n) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (n) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (n) is greater than the first number (n). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

Arrangement for actuating an element in a microlithographic projection exposure apparatus

A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

Projection exposure apparatus for microlithography for the production of semiconductor components

A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.

Gravitation compensation for optical elements in projection exposure apparatuses

An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.

The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.

Actuator including magnet for a projection exposure system and projection exposure system including a magnet

The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (n) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (n) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (n) is greater than the first number (n). In accordance with one aspect, at least one of the ac-tuators is arranged in a node of at least one natural vibration mode of the optical element.

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

Illumination system for illuminating a mask in a microlithographic exposure apparatus

The present invention relates to a method and a device for controlling multiple actuators with a controller and multiple actuators controllable by the controller. At least several groups of actuators are individually controllable by the controller and to each actuator or each group of actuators is assigned at least one memory storage unit, which can store at least one parameter for controlling one or more actuators. At least two parameters are assigned to each actuator or each group of actuators, with one position of the actuator(s) being assigned to each of the parameters.

Method and device for controlling a plurality of actuators and an illumination device for lithography

An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

Immersion lithography objective

Growing community of inventors

Heidenheim, Germany

Juergen Fischer