Carl Zeiss Smt Gmbh

Juergen Baier

Rolf Freimann

Steffen Fritzsche

Hubert Holderer

Matthias Manger

Ulrich Mueller

Markus Holz

Daniel Runde

Joachim Welker

Joerg Lichtenthaeler

André Orthen

Damian Fiolka

The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided.

Optical system

The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.

Method for producing an illumination system for an EUV projection exposure system, and illumination system

A method for producing a lens for a lithography apparatus is disclosed. A measurement system for ascertaining an optical characteristic of a partial lens for a lithography apparatus is also disclosed.

Method for producing a lens for a lithography apparatus, and measurement system

An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.

Optical system and multi facet mirror of a microlithographic projection exposure apparatus

Growing community of inventors

Oberkochen, Germany

Juergen Baier