International Business Machines Corporation

Other

Lockheed Martin Corporation

Juan R Maldonado

Raul E Acosta

Marie Angelopoulos

Fuad Elias Doany

Jane M Shaw

Chandrasekhar Narayan

James L Speidell

Kurt R Kimmel

Timothy R Groves

Timothy James Smith

Andrew T Pomerene

John M Warlaumont

Mark Edward Nosewicz

Yuli Vladimirsky

Vincent Di Milia

A method, system and program product for overriding existing functionality provided in an application programming interface (API) for a local protocol implementation is provided. The method includes providing an API for a local protocol implementation having a raw interface function that can be invoked by a client application to override existing functionality provided in the API. The method further includes defining for the raw interface function an array of pre-formed payload elements to be included for creating a customized protocol request message for requesting a protocol service from a server application using a remote protocol implementation different than the local protocol implementation, populating data for each element in the array defined, and invoking the raw interface function, which takes as input the array defined and inserts them, in order, behind a protocol message header of the protocol request message and sends the customized protocol request message to the server application.

Method, system and program product for adapting to protocol changes

A universal mask for use in making Integrated Circuits. The individual size masks are produced on a wafer having standardized, large size membrane area. A combined X-ray blocking and membrane stiffening layer is applied on at least one side of the wafer. This stiffening/blocking layer includes an X-ray transparent region having a size commensurate with the desired exposure field and aligned therewith.

X-ray mask structure

An X-ray mask pellicle is capable of protecting the X-ray mask from contaminants and the wafer from contact with the X-ray absorber material of the mask. The X-ray mask pellicle is sufficiently thin to allow X-ray exposure at the required mask to wafer gaps yet is sufficiently durable, replaceable, tough and X-ray resistant to be used in X-ray lithography. A thin (organic or inorganic) X-ray mask pellicle to be placed covering the X-ray mask pattern area is fabricated as a thin film and attached to a support ring. A selected area of the pellicle film, tailored to cover the absorber pattern in the X-ray mask, is etched to decrease its thickness to below 2 .mu.m. If the thin film of the pellicle is not itself conductive, a thin conductive film may be coated on both sides. In an alternative embodiment, the separation between the pellicle and the X-ray mask can be achieved by forming the mask with a stepped profile.

X-ray mask pellicle

X-ray lithography is used in the fabrication of very large scale integrated circuits. Optical lithography techniques are used to create a preliminary mask with coarse features in the preparation of a high resolution x-ray mask. The E-beam tool may register the location of the E-beam relative to the optically written coarse features. This helps the tool to navigate according to the location of specific features.

High accuracy fabrication of X-ray masks with optical and E-beam

A pool table including a plurality of numbered balls. Also included is a playing surface with a rectangular configuration having a plurality of divots formed therein. Further provided is a ball collection assembly including a rectilinear periphery integrally formed about the edges of the playing surface with a plurality of vertically oriented bores formed therein. The ball collection assembly further includes at least one cut out formed in a top edge of the periphery. A spring is also included. Finally, at least one pool stick is adapted to utilize the spring for imparting motion to one of the balls.

Billiard/checkers game

This is a process for aligning an x-ray lithography system including an x-ray mask and a work piece with an alignment mark. A zone plate lens is used in the x-ray mask. X-rays are directed through the zone plate lens to the alignment mark to detect when the lens is aligned with the mark by emission of photoelectrons generated by the work piece in response to the x-rays. The change of current when the x-ray beam crosses a feature on the alignment mark is detected by a properly biased zone plate or grating. The alignment mark can be an etched slot or a metal feature.

X-ray metrology and alignment detection system

A thin film structure for correcting magnification errors in X-ray lithography. On a conductive substrate a low dielectric constant thin film is deposited. A piezoelectric film is deposited on the low dielectric constant thin film. An electrode array is positioned on the piezoelectric film to provide a relatively uniform electric field across the electrode array. The structure may be oriented around or in the X-ray exposure area. If located outside it may be orthogonally or circularly placed about the exposure area.

System for magnification correction of conductive X-ray lithography mask

A pinchuck is formed in accordance with this invention by using lithographic techniques to define and to etch a pattern of pins from an extremely flat etchable surface. Since the pins are formed from a surface which is already flat, it is not necessary to level or polish the pins after they are formed. Since lithographic techniques are used, the pin head dimensions, the number of pins, the arrangement of pins, and the density of pins all may be freely chosen without affecting the fabrication cost. By surrounding the region of etched pins with an unetched band, a raised peripheral ring will be formed which can act as a vacuum sealing ring when the pinchuck is used as a vacuum pinchuck. By fabricating the pins from an electrically conductive material (such as doped silicon) and then covering the pins with a dielectric film (such as silicon dioxide), the pinchuck can be used as an electrostatic pinchuck. By doing both, the same pinchuck can be used as an electrostatic pinchuck or as a vacuum pinchuck or as both simultaneously.

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Chappaqua, NY, United States of America

Juan R Maldonado