Electronics and Telecommunications Research Institute

Ju Wook Lee

Sang Gi Kim

Yong Sun Yoon

Jin Gun Koo

Kun Sik Park

Seong Wook Yoo

Jong Moon Park

Yoon Kyu Bae

Byung Won Lim

Boo Woo Kim

Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides of the optical path changer to change the path of the light; second mirrors installed at both sides of a material to change the path of the light; and third mirrors installed at both sides of a mask to enter the light reflected by the first mirrors to the mask and to enter the light passed through the mask into the second mirrors, whereby it is possible to continuously expose one surface, both surfaces or a specific surface of a wafer in a state that the wafer is once aligned.

Exposure apparatus

Growing community of inventors

Daejeon, South Korea

Ju Wook Lee