Samsung Electronics Co., Ltd.

Ju-A Ryu

Yo-Han Ahn

Ji-Young Kim

Joo-Young Kim

Dong-Seok Ham

Yang-Koo Lee

Hyung-Seok Choi

Hweon Jin

Myung-Ki Lee

Jeong-Heung Kong

Chang-Min Cho

Hun-Hwan Ha

The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

Substrate treating apparatus and exposing apparatus for cleaning a chuck cleaning tool with treating bath

An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.

Air filtering device and cleaning system of semiconductor manufacturing apparatus with the same

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Seoul, South Korea

Ju-A Ryu