Kla Tencor Corporation

Kla Corporation

Ushio Inc.

Joshua Wittenberg

Ilya Bezel

Anant Chimmalgi

Lauren Wilson

Anatoly Shchemelinin

Rahul Yadav

Kenneth P Gross

Mark Shi Wang

Richard William Solarz

Matthew Derstine

Matthew Panzer

Xiumei Liu

Sumeet Kumar

Brooke Bruguier

Sebaek Oh

Yoshio Kagebayashi

Rajkeshar Singh

Shinichiro Nozaki

Michael Navone

Aizaz Bhuiyan

A method of forming a high-pressure plasma lamp includes providing a lamp bulb. The lamp bulb includes a top channel and a bottom channel. The method includes inserting a top electrode element into the top channel of the lamp bulb. The method includes providing a glass tubular structure attached to a bottom electrode element. The method includes filling the lamp bulb with a liquified gas through the bottom channel of the lamp bulb. The method includes inserting the bottom electrode element and the glass tubular structure into the bottom channel.

Method of fabricating a high-pressure laser-sustained-plasma lamp

A plasma lamp for use in a broadband plasma source of an inspection tool is disclosed. The plasma lamp includes a plasma bulb configured to contain a gas and generate a plasma within the plasma bulb. The plasma bulb is formed from a material at least partially transparent to illumination from a pump laser and at least a portion of broadband radiation emitted by the plasma. The plasma bulb includes a conical pocket. The conical pocket is configured to disrupt a plume rising from the plasma.

Conical pocket laser-sustained plasma lamp

A broadband illumination source is disclosed. The broadband illumination source may include a pump source configured to generate pump illumination. The broadband illumination also includes an active medium containing nanocrystals. The broadband illumination source includes pump illumination optics configured to direct pump illumination into the active medium. The active medium is configured to emit broadband illumination by down-converting a portion of the pump illumination via photoluminescence.

Nanocrystal-based light source for sample characterization

A laser-sustained plasma lamp includes a gas containment structure configured to contain a volume of gas. The gas containment structure is configured to receive pump illumination from a pump laser for generating a plasma within the volume of gas. The gas containment structure includes one or more transmissive structures being at least partially transparent to the pump illumination from the pump laser and at least a portion of the broadband radiation emitted by the plasma. The one or more transmissive structures have a graded absorption profile so as to control heating of the one or more transmissive structures caused by the broadband radiation emitted by the plasma.

Laser sustained plasma light source with graded absorption features

An illumination pump source is disclosed. The illumination pump source includes a set of power sources configured to generate a set of laser beams, with at least some of the set of laser beams configured to include illumination having different wavelengths. The illumination pump source also includes an optical fiber. The illumination pump source also includes one or more optical elements, the one or more optical elements configured to couple the illumination from at least some of the laser beams to one or more regions of the optical fiber.

System and method for laser-sustained plasma illumination

A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.

System and method for inhibiting VUV radiative emission of a laser-sustained plasma source

A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element. The gas containment element is configured to contain a volume of a gas mixture. The collector element is configured to focus the pump illumination from the pumping source into the volume of the gas mixture contained within the gas containment element in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas mixture filters one or more selected wavelengths of radiation emitted by the plasma.

System and method for inhibiting radiative emission of a laser-sustained plasma source

Systems and methods for providing laser sustained plasma light sources are disclosed. Different from conventional laser sustained plasma light sources where one fiber size and one wavelength combination is used in the lamphouse to generate light for different bands and pixel sizes, switchable fiber sizes and wavelength combinations are provided for optimal power output in different wavelength bands and pixel sizes. More specifically, switchable fiber configurations are provided where larger fibers with higher pump powers are used for bigger pixel sizes and higher wavelength bands while smaller fibers are used for smaller pixel size and shorter wavelength bands. Additionally and/or alternatively, pumping schemes are provided where pump wavelengths close to the absorption peak of the gas fill are used for bigger pixel sizes while pump wavelengths away from the gas fill absorption peak are used for smaller pixel sizes.

Growing community of inventors

Fremont, CA, United States of America

Joshua Wittenberg