Applied Materials, Inc.

Joshua Putz

Paul E Fisher

Jay J Jung

Youssef A Loldj

Mehran Moalem

Andreas Neuber

Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.

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Fairfield, CA, United States of America

Joshua Putz