Asml Netherlands B.v.

Joshua Mark Lukens

Bob Rollinger

Alexander Igorevich Ershov

Georgiy Olegovich Vaschenko

Chirag Rajyaguru

Jon David Tedrow

Yoshiho Amada

Mathew Cheeran Abraham

Serkan Kincal

Pooriya Beyhaghi

David Bessems

Sandeep Rai

Petrus Adrianus Willems

Abhiram Lakshmi Ganesh Govindaraju

An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction that is different than the first direction, a first portion of the tube passes through an opening in the second body wall the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.

Nozzle apparatus

An apparatus for monitoring a stream of droplets of target material for generating a radiation beam in a radiation source, wherein the apparatus comprises: a target material emitter for creating the stream of droplets of target material, wherein the target material emitter comprises a chamber configured for the target material to pass through before forming the stream of droplets; a first transducer configured to generate acoustic pressures in the chamber, and a second transducer configured to sense the acoustic pressures in the chamber.

Apparatus for and method of monitoring droplets in a droplet stream

Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.

Target material control in an EUV light source

Disclosed is a system for generating EUV radiation in which current flowing through target material in the orificeof a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.

Apparatus and method for extending target material delivery system lifetime

Provided is an apparatus for and method of controlling formation of droplets () used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source () includes a fluid exiting an nozzle () and a sub-system having an electro-actuatable element () producing a disturbance in the fluid (). The droplet source produces a stream () that breaks down into droplets that in turn coalesce into larger droplets as they progress towards the irradiation region. The electro-actuatable element is driven by a hybrid waveform that controls the droplet generation/coalescence process. Also disclosed is a method of determining the transfer function for the nozzle.

Apparatus for and method of controlling coalescence of droplets in a droplet stream

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San Diego, CA, United States of America

Joshua Mark Lukens