International Business Machines Corporation

Globalfoundries Inc.

Applied Materials, Inc.

Advanced Micro Devices Corporation

Joshua L Herman

Son Van Nguyen

Alfred Grill

Hosadurga K Shobha

E Todd Ryan

Griselda Bonilla

Jeffrey James Jonas

Ritwik Bhatia

A method of forming a carbon-rich silicon carbide-like dielectric film having a carbon concentration of greater than, or equal to, about 30 atomic % C and a dielectric constant of less than, or equal to, about 4.5 is provided. The dielectric film may optionally include nitrogen. When nitrogen is present, the carbon-rich silicon carbide-like dielectric film has a concentration nitrogen that is less than, or equal, to about 5 atomic % nitrogen.

Advanced low k cap film formation process for nano electronic devices

A carbon-rich silicon carbide-like dielectric film having a carbon concentration of greater than, or equal to, about 30 atomic % C and a dielectric constant of less than, or equal to, about 4.5 is provided. In some embodiments, the dielectric film may optionally include nitrogen. When nitrogen is present, the carbon-rich silicon carbide-like dielectric film has a concentration nitrogen that is less than, or equal, to about 5 atomic % nitrogen. The carbon-rich silicon carbide-like dielectric film can be used as a dielectric cap layer in an interconnect structure. The inventive dielectric film is highly robust to UV curing and remains compressively stressed after UV curing. Moreover, the inventive dielectric film has good oxidation resistance and prevents metal diffusion into an interconnect dielectric layer. The present invention also provides an interconnect structure including the inventive dielectric film as a dielectric cap. A method of fabricating the inventive dielectric film is also provided.

A system and method for resolving identities that are indefinitely resolvable is presented. A resolution manager retrieves an account and resolves the account to existing entities. When the account is resolved into an existing entity, the resolution manager proceeds through a sequence of steps to ensure a load order independent resolution outcome by unresolving the entity, and possibly related entities, if resolution ambiguity arises. When the account does not resolve to an existing entity, the resolution manager creates a new entity with the account, and checks whether the new entity has relationships with other entities. If so, the resolution manager proceeds through the sequence of steps to ensure a load order independent resolution outcome as discussed above.

System and method for resolving identities that are indefinitely resolvable

A dielectric cap, interconnect structure containing the same and related methods are disclosed. The inventive dielectric cap includes a multilayered dielectric material stack wherein at least one layer of the stack has good oxidation resistance, Cu diffusion and/or substantially higher mechanical stability during a post-deposition curing treatment, and including Si&#x2014;N bonds at the interface of a conductive material such as, for example, Cu. The dielectric cap exhibits a high compressive stress and high modulus and is still remain compressive stress under post-deposition curing treatments for, for example: copper low k back-end-of-line (BEOL) nanoelectronic devices, leading to less film and device cracking and improved reliability.

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Troy, NY, United States of America

Joshua L Herman