Growing community of inventors

Eindhoven, Netherlands

Josephus J M Braat

Average Co-Inventor Count = 1.16

ph-index = 6

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 180

Josephus J M BraatRifat Ata Mustafa Hikmet (1 patent)Josephus J M BraatWillem Gerard Ophey (1 patent)Josephus J M BraatBernardus H W Hendriks (1 patent)Josephus J M BraatJan Willem Verhoeven (1 patent)Josephus J M BraatJosephus J M Braat (12 patents)Rifat Ata Mustafa HikmetRifat Ata Mustafa Hikmet (314 patents)Willem Gerard OpheyWillem Gerard Ophey (25 patents)Bernardus H W HendriksBernardus H W Hendriks (19 patents)Jan Willem VerhoevenJan Willem Verhoeven (10 patents)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. U.S. Philips Corporation (8 from 14,087 patents)

2. Koninklijke Philips Corporation N.v. (4 from 21,361 patents)


12 patents:

1. 6800861 - Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

2. 6788644 - Devuce and method for forming a focus error signal based on ohase difference between corresponding parts of detector signals

3. 6781104 - Device for scanning an optical record carrier

4. 6396067 - Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

5. 6386715 - Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

6. 6366335 - Polarization-sensitive beam splitter, method of manufacturing such a beam splitter and magneto-optical scanning device including such a beam splitter

7. 6317276 - Optical lens system and scanning device provided with such a system

8. 6299318 - Mirror projector system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

9. 6280906 - Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method

10. 6255661 - Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

11. 6199991 - Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

12. 6192022 - Focusing a light beam more than thirty focal depths from the aplanatic point with a plano-convex lens

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