Asml Netherlands B.v.

Josephus Cornelius Johannes Antonius Vugts

Jan Frederik Hoogkamp

Johannes Hendrikus Gertrudis Franssen

Albert Jan Hendrik Klomp

Robert Gordon Livesey

Erik Roelof Loopstra

Hans Jansen

Johannes Petrus Martinus Bernardus Vermeulen

Teunis Cornelis Van Den Dool

Johannes Christiaan Leonardus Franken

Anthonius Martinus Cornelis Petrus De Jong

Jacques Cor Johan Van Der Donck

Raimond Visser

Gerrit Oosterhuis

Pieter Johannes Marius Van Groos

Martinus Wilhelmus Van Den Heuvel

Leo Wilhelmus Maria Kuipers

Henricus Johannes Louis Marie Vullings

A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.

Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus

A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.

Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system

A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.

Load lock and method for transferring objects

A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

Method and apparatus for maintaining a machine part

A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.

Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock

Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.

Lithographic projection assembly, load lock and method for transferring objects

Growing community of inventors

Waalwijk, Netherlands

Josephus Cornelius Johannes Antonius Vugts