Tokyo Electron Limited

Advanced Lighting Technologies, Inc.

Cu Aerospace, LLC

University of Illinois

Joseph T Verdeyen

Murray D Sirkis

Wayne L Johnson

David Loren Carroll

Ju Gao

Clark J Wagner

James Gary Eden

Darren King

Jason D Readle

Wayne S Solomon

Wayne C Solomon

The present invention provides in one of the embodiments for either a continuous wave (cw) or pulsed alkali laser having an optical cavity resonant at a wavelength defined by an atomic transition, a van der Waals complex within the optical cavity, the van der Waals complex is formed from an alkali vapor joined with a polarizable gas, and a pump laser for optically pumping the van der Waals complex outside of the Lorentzian spectral wings wherein the van der Waals complex is excited to form an exciplex that dissociates forming an excited alkali vapor, generating laser emission output at the wavelength of the lasing transition.

Atomic lasers with exciplex assisted absorption

A method of generating an electrical discharge in a gas contained in a sealed enclosure. The method includes driving a helical coil resonator at an RF frequency to generate an RF electric-magnetic field sufficient to generate an electrical discharge in the high pressure gas. The electrical discharge produces an emission spectrum that may be spectroscopically analyzed to determine the composition and impurity content of the gas.

System and method for generating a discharge in gases

In one embodiment of the present invention an oxygen iodine laser includes a gas mixing section. Ground state oxygen and a carrier gas are introduced into the first gas mixing section, sometimes separately. The laser includes a discharge region to generate at least said excited oxygen from the flow of the first gas mixing section. A sensitizer gas having a lower ionization threshold than ground state oxygen is also introduced into the first gas mixing section, such that electrons are more easily produced in the electrical generator. The laser system includes introducing a source of iodine into the excited singlet delta oxygen flow to generate a laser-active gas. In another embodiment a conditioner is placed into the gas mixing section to help mix the flow and/or introduce one or more of the aforementioned gases.

Method, system and apparatus for an enhanced electrically pumped oxygen iodine laser

A method of generating an electrical discharge in a high pressure gas contained in a sealed enclosure. The method includes driving a helical coil resonator at an RF frequency to generate an RF electric-magnetic field sufficient to generate an electrical discharge in the high pressure gas. The electrical discharge produces an emission spectrum that may be spectroscopically analyzed to determine the composition and impurity content of the gas.

System and method for generating a discharge in high pressure gases

A system for measuring plasma electron densities (e.g., in the range of 1010 to 1012 cm&#x2212;3) and for controlling a plasma generator. Measurement of the plasma electron density is used as part of a feedback control in plasma-assisted processes, such as depositions or etches. Both the plasma measurement method and system generate a control voltage that in turn controls the plasma generator. A programmable frequency source sequentially excites a number of the resonant modes of an open resonator placed within the plasma processing apparatus. The resonant frequencies of the resonant modes depend on the plasma electron density in the space between the reflectors of the open resonator. The apparatus automatically determines the increase in the resonant frequency of an arbitrarily chosen resonant mode of the open resonator due to the introduction of a plasma and compares that measured frequency to data previously entered. The comparison is by any one of (1) dedicated circuitry, (2) a digital signal processor, and (3) a specially programmed general purpose computer. The comparator calculates a control signal which is used to modify the power output of the plasma generator as necessary to achieve the desired plasma electron density.

Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma

A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.

Stabilized oscillator circuit for plasma density measurement

A system for measuring plasma electon densities (e.g., in the range of 10 to 10 cm ) and for controlling a plasma generator ( ). Measurement of the plasma density is essential if plasma-assisted processes, such depositions or etches, are to be adequately controlled using a feedback control. Both the plasma measurement method and system generate a control voltage that in turn controls the plasma generator ( ) to maintain the plasma electron density at a pre-selected value. The system utilizes a frequency stabilization system to lock the frequency of a local oscillator ( ) to the resonant frequency of an open microwave resonator ( ) when the resonant frequency changes due to the introduction of a plasma within the open resonator. The amplified output voltage of a second microwave discriminator may be used to control a plasma generator ( ).

Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma

A method and system for measuring at least one of a plasma density and an electron density (e.g., in a range of 10 to 10 electrons/cm ) using plasma induced changes in the frequency of a microwave oscillator. Measurement of at least one of the plasma density and the electron density enables plasma-assisted processes, such as depositions or etches, to be controlled using a feedback control. Both the measurement method and system generate a control voltage that in turn controls a plasma generator to maintain at least one of the plasma density and the electron density at a pre-selected value.

Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator

A method, apparatus and system are provided herein for an electrically assisted chemical oxygen iodine laser. The preferred system, in accordance with the present invention, includes a laser resonator with a laser-active gas mixture of at least excited oxygen and dissociated iodine. A first electrical generator in which a primary flow of at least excited oxygen is electrically generated from a first gas that includes at least ground state oxygen. A second electrical generator in which a secondary flow of at least dissociated iodine atoms is electrically generated from a second gas that includes at least diatomic iodine. The system further includes a means to inject the secondary flow into the primary flow to generate the laser-active gas mixture.

Growing community of inventors

Savoy, IL, United States of America

Joseph T Verdeyen