Kla Tencor Corporation

Joseph R Carter

Adam Eales Norton

Kenneth C Johnson

Xing Chen

Jennming Chen

Because of diffraction effects caused by slits or apertures in optical measurement systems, the radiation energy which is directed towards a particular region on a sample will be spread over a larger area than desirable. By employing an apodizing filter in the radiation path in such system, diffraction tails of the system will be reduced. The apodizing filter preferably has a pattern of alternating high transmittance areas and substantially opaque areas where the locally averaged transmittance function is an apodizing function. In the preferred embodiment, the locally averaged transmittance function varies smoothly and monotonically from the periphery to the center of the filter.

Apodizing filter system useful for reducing spot size in optical

The pixel position-to-wavelength calibration function of film measurement devices such as spectroscopic ellipsometers and spectroreflectometers may shift due to temperature and humidity changes and mechanical factors. One or more wavelength markers provided by the light source or reference sample may be used to correct the calibration function. The pixel positions of one or more persistent wavelength markers are noted during the calibration process and the current positions of such markers are again noted to account for shifts due to various factors to correct the calibration function.

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San Jose, CA, United States of America

Joseph R Carter