Rohm & Haas Electronic Materials LLC

Shipley Company LLC

Joseph Mattia

Cheng-Bai Xu

Mingqi Li

George G Barclay

Emad Aqad

Wang Yueh

Cong Liu

Stefan J Caporale

Zhibiao Mao

Shintaro Yamada

Ching-Lung Chen

New photoacid generator compounds ('PAGs') are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.

Cholate photoacid generators and photoresists comprising same

A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula:(R)&#x2014;(Ar)&#x2014;S(&#x2014;CH&#x2014;)&#xb7;OS&#x2014;(CR)-(L)-Xwherein each Ris independently a substituted or unsubstituted Calkyl group, Caryl group, Caralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic Caryl group, each Ris independently H, F, a linear or branched Cfluoroalkyl or a linear or branched heteroatom-containing Cfluoroalkyl, L is a Clinking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, Cor greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

Photoresist composition

New methods are provided for synthesis of photoacid generator compounds ('PAGs'), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.

Photoacid generators and photoresists comprising same

The present invention provides novel alicyclic-esterified norbornene carboxylates monomers, polymers and photoresist compositions that comprise the polymers as a resin binder component. Methods for synthesis of the monomers and polymers of the invention are also provided. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including sub-300 and sub-200 nm wavelengths such as 193 nm and 157 nm.

Monomers, polymers, methods of synthesis thereof and photoresist compositions

The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.

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Framingham, MA, United States of America

Joseph Mattia